公开(公告)号：US10030113B2

公开(公告)日：2018-07-24

申请号：US15301213

申请日：2015-03-27

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Azusa Suzuki ,  Hiroyuki Iwahashi ,  Takeshi Nishizono ,  Shigeki Matsui ,  Kazutoshi Haraguchi

IPC: B32B27/00 ,  C08J7/04 ,  B65D65/42 ,  C23C16/02 ,  C23C16/40 ,  C23C16/44 ,  H01J37/32 ,  C23C18/12 ,  B05D3/14 ,  B05D7/04 ,  B05D3/02

Abstract: The invention provides a gas barrier film with low deterioration in the gas barrier property before and after high-temperature hot water treatment. The gas barrier film has a gas barrier coating film, formed as a composite film comprising a network structure having a mesh structure with Si—O—Si bonds as the basic lattice and a water-soluble polymer crystallized as microcrystals, incorporated into the mesh of the network structure, wherein a barrier coating agent, obtained by mixing a condensate solution of an alkoxysilane hydrolysate prepared as a mixed solution in which the proportion of bonded states of the silicon atoms of the condensate with Q1 and Q2 structures is at least 60% of the total silicon atoms, with a crystalline water-soluble polymer, is coated on a base material film, either after forming or without forming an aluminum oxide vapor deposition film, to form a coating layer.

公开(公告)号：US12060207B2

公开(公告)日：2024-08-13

申请号：US16981201

申请日：2019-03-20

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Yoshihiro Kishimoto ,  Azusa Suzuki ,  Kanari Aono ,  Yasunari Iio ,  Shohei Itami

IPC: B65D65/42 ,  B32B27/08 ,  B32B27/36 ,  B65D65/40 ,  C08J7/04 ,  C08J7/043 ,  C08J7/048 ,  C08J7/06 ,  C08J7/12 ,  C23C18/20 ,  C23C18/22

CPC classification number: B65D65/42 ,  B32B27/08 ,  B32B27/36 ,  B65D65/40 ,  C08J7/06 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2307/31 ,  B32B2553/00 ,  C08J7/042 ,  C08J7/0423 ,  C08J7/043 ,  C08J7/048 ,  C08J7/123 ,  C08J2367/02 ,  C23C18/2026 ,  C23C18/22

Abstract: Provided are: a laminate film which is equipped with a vapor-deposited aluminum oxide film exhibiting high barrier performance and excellent so-called retort resistance, and also exhibits favorable adhesion between the vapor-deposited aluminum oxide film and a plastic substrate even after undergoing a hydrothermal treatment; a barrier laminate film containing the laminate film; and a barrier packaging material which uses the barrier laminate film. A laminate film exhibiting improved adhesion strength and barrier performance, wherein: a transition region prescribing adhesion strength is formed between the surface of the substrate film and the vapor-deposited film which primarily comprises the formed vapor-deposited aluminum oxide film, by subjecting the vapor-deposited aluminum oxide film of the laminate film to a time-of-flight secondary ion mass spectrometry (TOF-SIMS) method using a Cs (cesium) ion gun; the transition region contains elementally bonded Al2O4H, which can be modified into aluminum hydroxide which can be detected by etching using TOF-SIMS; and the rate of modification in the transition region into aluminum hydroxide, which is defined as the ratio of the modified transition region to the vapor-deposited aluminum oxide film specified by carrying out etching using TOF-SIMS, is prescribed to be 5-60%, inclusive.

公开(公告)号：US11655087B2

公开(公告)日：2023-05-23

申请号：US16982380

申请日：2019-03-20

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Yoshihiro Kishimoto ,  Azusa Suzuki

IPC: B65D65/42 ,  C23C14/02 ,  C23C14/08 ,  C23C14/24 ,  B32B9/00 ,  B32B27/36 ,  B32B15/00 ,  B32B9/04 ,  B32B15/04 ,  B32B27/08 ,  B32B15/08 ,  B32B15/09

CPC classification number: B65D65/42 ,  B32B9/00 ,  B32B9/041 ,  B32B15/00 ,  B32B15/04 ,  B32B27/08 ,  B32B27/36 ,  C23C14/02 ,  C23C14/081 ,  C23C14/24 ,  B32B15/08 ,  B32B15/09 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/26 ,  B32B2255/28 ,  B32B2307/31 ,  B32B2307/724 ,  B32B2307/7242 ,  B32B2307/7244 ,  Y10T428/1352

Abstract: The present invention addresses the problem of providing a barrier resin film exhibiting excellent barrier properties without adopting a multilayer structure such as the structures used by the prior art. A barrier resin film obtained by forming a vapor-deposited aluminum oxide film on the surface of a resin substrate, wherein an elementally bonded structural unit represented by Al3 is distributed in the vapor-deposited aluminum oxide film, and the intensity ratio (Al3/Al2O3×100) of the maximum Al3 concentration elementally bonded structure section according to Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is 1-20, inclusive.