公开(公告)号：US20210255554A1

公开(公告)日：2021-08-19

申请号：US17307363

申请日：2021-05-04

Applicant: Carl Zeiss SMT GmbH

Inventor： Thilo Pollak ,  Dietmar Duerr

IPC: G03F7/20

Abstract: A module for a projection exposure apparatus for semiconductor lithography includes at least one optical element arranged in a holder. At least one spacer is arranged between the holder and a further holder or a main body. The spacer is designed to semi-actively vary its extent. A method for positioning at least one holder in a projection exposure apparatus for semiconductor lithography includes using a semi-active spacer is to position the holder.

公开(公告)号：US20230142187A1

公开(公告)日：2023-05-11

申请号：US18153640

申请日：2023-01-12

Applicant: Carl Zeiss SMT GmbH

Inventor： Johannes Lippert ,  Toralf Gruner ,  Kerstin Hild ,  Hans-Michael Stiepan ,  Thilo Pollak ,  Jeffrey Cavaco

IPC: G03F7/20 ,  G02B13/16 ,  G02B26/08 ,  H10N30/80 ,  H10N30/20

CPC classification number: G03F7/70266 ,  G03F7/70891 ,  G02B13/16 ,  G02B26/0825 ,  H10N30/802 ,  H10N30/206

Abstract: A projection exposure apparatus comprises a projection objective, and the projection objective comprises an optical device, wherein the optical device comprises an optical element having an optically effective surface and an electrostrictive actuator. The electrostrictive actuator is deformable by a control voltage being applied. The electrostrictive actuator is functionally connected to the optical element to influence the surface shape of the optically effective surface. A control device supplies the electrostrictive actuator with the control voltage. A measuring device is configured, at least at times while the electrostrictive actuator influences the optically effective surface of the optical element, to measure directly and/or to determine indirectly the temperature and/or a temperature change of the electrostrictive actuator and/or the surroundings thereof to take account of a temperature-dependent influence during driving of the electrostrictive actuator by the control device.

公开(公告)号：US20240085783A1

公开(公告)日：2024-03-14

申请号：US18512872

申请日：2023-11-17

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Raab ,  Stefan Troeger ,  Sascha Bleidistel ,  Thilo Pollak ,  Alexander Vogler ,  Klaus Gwosch ,  Andreas Koeniger ,  Matthias Manger

IPC: G03F7/00 ,  G01L1/22 ,  G01L1/24 ,  G02B6/02 ,  G02B6/293 ,  G02B6/38 ,  G02B6/42

CPC classification number: G03F7/0005 ,  G01L1/2287 ,  G01L1/246 ,  G02B6/02152 ,  G02B6/2935 ,  G02B6/3861 ,  G02B6/4298

Abstract: An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.

公开(公告)号：US20240085800A1

公开(公告)日：2024-03-14

申请号：US18507893

申请日：2023-11-13

Applicant: Carl Zeiss SMT GmbH

Inventor： Thilo Pollak ,  Dietmar Duerr ,  Irina Schrezenmeier ,  Joerg Tschischgale ,  Matthias Manger ,  Andreas Beljakov ,  Stefan Baueregger ,  Alexander Ostendorf ,  Dieter Bader ,  Markus Raab ,  Bastian Keller

IPC: G03F7/00 ,  G02B5/08 ,  G02B5/09

CPC classification number: G03F7/70266 ,  G02B5/0891 ,  G02B5/09

Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.