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公开(公告)号：US11647288B2
公开(公告)日：2023-05-09
申请号：US16912837
申请日：2020-06-26
Applicant: Carl Zeiss SMT GmbH
Inventor： Mario Laengle
CPC classification number: H04N23/67 , G02B7/28 , G06T7/0004 , G06T7/60 , G06T2207/10148 , G06T2207/30148
Abstract: The invention relates to a device for measuring a mask for microlithography, the device including an imaging device and an autofocusing device. The imaging device comprises an imaging optical unit with a focal plane for imaging the mask, an object stage for mounting the mask, and a movement module for producing a relative movement between object stage and imaging optical unit. The autofocusing device is configured to generate a focusing image by way of the imaging of a focusing structure in a focusing image plane intersecting the focal plane, in which the focusing structure is embodied as a gap. Furthermore, the invention relates to an autofocusing method for a device for measuring a mask for microlithography.
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公开(公告)号：US12158703B2
公开(公告)日：2024-12-03
申请号：US17969967
申请日：2022-10-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Lukas Fischer , Klaus Gwosch , Markus Koch , Mario Laengle , Daniel Pagel
IPC: G03F7/00
Abstract: An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out. Then, the object holder is adjusted by actuator means until a coarse target wavefront (W1) is obtained for a coarse actuator position set (X1) in the case of a minimum wavefront deviation between the actual wavefront and the design wavefront (WD). Said coarse target wavefront is then subjected to a fine measurement and the at least one optical component is displaced until a fine target wavefront (W2) is obtained for a fine actuator position set (X2) in the case of a minimum deviation between the actual wavefront setting-in in that case and the design wavefront (WD). This reproduction method allows wavefront deviations of the optical measuring system generated by way of targeted misalignment to provide a good approximation of corresponding deviations of the optical production system.
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公开(公告)号：US20230130187A1
公开(公告)日：2023-04-27
申请号：US17969967
申请日：2022-10-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Lukas Fischer , Klaus Gwosch , Markus Koch , Mario Laengle , Daniel Pagel
IPC: G03F7/20
Abstract: An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out. Then, the object holder is adjusted by actuator means until a coarse target wavefront (W1) is obtained for a coarse actuator position set (X1) in the case of a minimum wavefront deviation between the actual wavefront and the design wavefront (WD). Said coarse target wavefront is then subjected to a fine measurement and the at least one optical component is displaced until a fine target wavefront (W2) is obtained for a fine actuator position set (X2) in the case of a minimum deviation between the actual wavefront setting-in in that case and the design wavefront (WD). This reproduction method allows wavefront deviations of the optical measuring system generated by way of targeted misalignment to provide a good approximation of corresponding deviations of the optical production system.
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公开(公告)号：US10578881B2
公开(公告)日：2020-03-03
申请号：US16220212
申请日：2018-12-14
Applicant: Carl Zeiss AG , Carl Zeiss SMT GmbH
Inventor： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
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公开(公告)号：US20220365449A1
公开(公告)日：2022-11-17
申请号：US17742733
申请日：2022-05-12
Applicant: Carl Zeiss SMT GmbH
Inventor： Mario Laengle
Abstract: The invention relates to a method for determining a registration error of a structure on a mask for semiconductor lithography, comprising the following method steps: generating an image of at least one region of the mask, determining at least one measuring contour in the image, and matching the forms of a design contour and a measuring contour to one another while at the same time matching the registration of the two contours.
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Patent Agency Ranking
公开(公告)号：US10168539B2
公开(公告)日：2019-01-01
申请号：US15895210
申请日：2018-02-13
Applicant: Carl Zeiss AG , Carl Zeiss SMT GmbH
Inventor： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
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7.发明申请公开(公告)号：US20180173001A1
公开(公告)日：2018-06-21
申请号：US15895210
申请日：2018-02-13
Applicant: Carl Zeiss AG , Carl Zeiss SMT GmbH
Inventor： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
CPC classification number: G02B27/0961 , G02B26/0833 , G02B27/0905 , G03F1/84
Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
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公开(公告)号：US20240393269A1
公开(公告)日：2024-11-28
申请号：US18670858
申请日：2024-05-22
Applicant: Carl Zeiss SMT GmbH
Inventor： Jens Oster , Ralf Schoenberger , Mario Laengle
IPC: G01N23/2251 , G01N23/203 , G06T7/00 , G06T7/13
Abstract: A method for analyzing an image of a microstructured sample which comprises at least one first segment and at least one second segment which has an edge and is raised vis-à-vis the first segment, wherein the image includes a two-dimensional (2D) intensity distribution, comprising: determining edge candidates of the at least one second segment on the basis of gradients of the two-dimensional intensity distribution; determining a one-dimensional (1D) intensity distribution of the image in a direction (R) perpendicular to the edge candidates, wherein in the direction (R), the one-dimensional intensity distribution comprises a first region with a first mean intensity value (I1), the edge candidates and a second region with a second mean intensity value (I2) greater than the first mean intensity value; and determining the edge candidate which among the edge candidates is closest to the first region of the one-dimensional intensity distribution as an edge of the at least one second segment.
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9.发明申请公开(公告)号：US20220383485A1
公开(公告)日：2022-12-01
申请号：US17751757
申请日：2022-05-24
Applicant: Carl Zeiss SMT GmbH
Inventor： Mario Laengle , Dmitry Klochkov
Abstract: The invention relates to a method and to an apparatus for analyzing an image of a microlithographic microstructured component wherein in the image each of a multiplicity of pixels is assigned in each case an intensity value. A method according to the invention comprises the following steps: isolating a plurality of edge fragments in the image;
classifying each of the isolated edge fragments either as a relevant edge fragment or as an irrelevant edge fragment; and ascertaining contiguous segments in the image based on the relevant edge fragments.-
10.发明申请公开(公告)号：US20190121145A1
公开(公告)日：2019-04-25
申请号：US16220212
申请日：2018-12-14
Applicant: Carl Zeiss AG , Carl Zeiss SMT GmbH
Inventor： Thomas Frank , Dirk Doering , Holger Seitz , Mario Laengle , Ulrich Matejka
Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.
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