公开(公告)号：US20240085779A1

公开(公告)日：2024-03-14

申请号：US18243769

申请日：2023-09-08

Applicant: Carl Zeiss SMT GmbH

Inventor： Renzo Capelli ,  Markus Koch ,  Tim Helbig ,  Sandro Hoffmann ,  Thomas Niederhausen ,  Grizelda Kersteen ,  Andreas Verch

IPC: G03F1/44 ,  G03F1/52 ,  G03F1/54 ,  G03F1/84

CPC classification number: G03F1/44 ,  G03F1/52 ,  G03F1/54 ,  G03F1/84

Abstract: A method for qualifying a mask for use in lithography is proposed. The method includes the following steps: a provision of an apparatus for qualifying a mask, the apparatus comprising an optical system and an evaluation and control device; a detection of at least one first phase difference of light at the mask by use of the optical system and the evaluation and control device; loading the mask; detecting at least one second phase difference of light at the mask by use of the optical system and the evaluation and control device; and implementing a comparison of the first phase difference with the second phase difference by use of the evaluation and control device.