公开(公告)号：US10854421B2

公开(公告)日：2020-12-01

申请号：US16429315

申请日：2019-06-03

申请人： Carl Zeiss Microscopy GmbH ,  Carl Zeiss Microscopy Ltd.

发明人： Daniela Donhauser ,  Christian Mueller ,  Barry Chamley ,  Tobias Volkenandt ,  Dirk Preikszas ,  Giuseppe Pavia ,  Heiko Stegmann

IPC分类号： H01J37/304 ,  H01J37/08 ,  H01J37/317

摘要： A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.

公开(公告)号：US20190304743A1

公开(公告)日：2019-10-03

申请号：US16429315

申请日：2019-06-03

申请人： Carl Zeiss Microscopy GmbH ,  Carl Zeiss Microscopy Ltd.

发明人： Daniela Donhauser ,  Christian Mueller ,  Barry Chamley ,  Tobias Volkenandt ,  Dirk Preikszas ,  Giuseppe Pavia ,  Heiko Stegmann

IPC分类号： H01J37/304 ,  H01J37/08

摘要： A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.