专利检索 ap:("Canon Nanotechnologies, Inc." OR "Toshiba Corporation") AND inv:"Seth J. Bamesberger" 第 1 页

1.

发明授权
Low contact imprint lithography template chuck system for improved overlay correction 有权

公开(公告)号：US09778578B2

公开(公告)日：2017-10-03

申请号：US14536069

申请日：2014-11-07

申请人： Canon Nanotechnologies, Inc. , Toshiba Corporation

发明人： Mario Johannes Meissl , Anshuman Cherala , Byung-Jin Choi , Seth J. Bamesberger

IPC分类号： G03B27/60 , G03F7/20 , G03F7/00

CPC分类号： G03F7/70708 , G03F7/0002

摘要： Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.

2.

发明申请
LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION 有权
标题翻译：用于改进的覆盖度校正的低接触式印刷机

公开(公告)号：US20150131072A1

公开(公告)日：2015-05-14

申请号：US14536069

申请日：2014-11-07

申请人： CANON NANOTECHNOLOGIES, INC. , TOSHIBA CORPORATION

发明人： Mario Johannes Meissl , Anshuman Cherala , Byung-Jin Choi , Seth J. Bamesberger

IPC分类号： G03F7/20

CPC分类号： G03F7/70708 , G03F7/0002

摘要： Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.

摘要翻译： 提供了压印光刻模板卡盘以及相当的系统和方法，其基本上保持了结构支撑功能，同时显着提高了压印质量功能。卡盘结合动态真空密封件，以便在对准和失真校正期间大大减少模板接触，同时在分离时仍然提供良好的结构支撑。