公开(公告)号：US20190201948A1

公开(公告)日：2019-07-04

申请号：US16326821

申请日：2017-08-24

Applicant: CORNING INCORPORATED

Inventor： Hsueh-Hung Fu ,  Jun-Yuan Hou ,  Tzu-Hen Hsu ,  Xiaofeng Mu ,  William Paul Ryszytiwskyj ,  Naiyue Zhou

IPC: B08B11/04 ,  B08B5/02 ,  B08B5/04

CPC classification number: B08B11/04 ,  B08B5/023 ,  B08B5/043 ,  C03B17/064

Abstract: An apparatus and method for cleaning a glass substrate is disclosed, the apparatus including a shroud assembly arranged along a conveyance path of a glass substrate such that an opening of shroud portion of the shroud assembly is adjacent the glass substrate. A nozzle assembly contained within a hollow interior space of the shroud assembly rotates while directing a jet of gas at the glass substrate, dislodging particulate. A vacuum is applied to a second interior hollow space defined by a skirt portion extending around the shroud, thereby removing the dislodged particulate. A second vacuum is applied to a back portion of the shroud to remove particulate accumulated in the shroud. The apparatus may further include a gas knife arranged adjacent the shroud assembly and a vacuum channel arranged below the shroud assembly.