公开(公告)号：US20240116075A1

公开(公告)日：2024-04-11

申请号：US18273353

申请日：2022-01-28

申请人： CENTRAL GLASS COMPANY, LIMITED

发明人： Takuya OKADA ,  Junki YAMAMOTO ,  Takahisa TANIGUCHI ,  Kazuki YOSHIURA ,  Katsuya KONDO ,  Soichi KUMON ,  Tatsuo MIYAZAKI

IPC分类号： B05D1/32 ,  B05D3/10

CPC分类号： B05D1/32 ,  B05D3/107

摘要： A selective film deposition method includes exposing a substrate having a structure on which a first surface region containing a metal element and a second surface region containing a nonmetal inorganic material are both exposed, to a solution containing an organic substance represented by formula (1) shown below and a solvent to deposit a film of the organic substance on the first surface region selectively over the second surface region: R1(X)m (1) wherein R1 is a C4-C100 hydrocarbon group optionally containing a heteroatom or a halogen atom, and m hydrogen atoms of the hydrocarbon group are replaced with X; X is —PO3(R2)2, —O—PO3(R2)2, —CO2R2, —SR2, or —SSR1; each R2 is a hydrogen atom or a C1-C6 alkyl group; and m is a positive integer, and m/r is 0.01 to 0.25 where r is the number of carbons of the hydrocarbon group.

公开(公告)号：US20220081575A1

公开(公告)日：2022-03-17

申请号：US17421507

申请日：2020-01-07

申请人： CENTRAL GLASS COMPANY, LIMITED

发明人： Masutaka SHINMEN ,  Takuya OKADA ,  Junki YAMAMOTO ,  Ryo NADANO ,  Tatsuo MIYAZAKI

IPC分类号： C09D7/20 ,  C07C211/03 ,  B05D1/00

摘要： The selective film deposition method according to an embodiment of the present disclosure includes depositing a film of an organic matter represented by the following formula (1) on a substrate having a structure where a first surface region containing at least one of a metal or a metal oxide and a second surface region containing a nonmetallic inorganic material are both exposed, selectively in the first surface region than in the second surface region, wherein N represents a nitrogen atom; and R1 represents a C1-C30 hydrocarbon group optionally containing a hetero atom or a halogen atom, R2, R3, R4, and R5 each independently represent a hydrogen atom or a C1-C10 hydrocarbon group optionally containing a hetero atom or a halogen atom, where the hydrocarbon group covers a branched or cyclic hydrocarbon group when containing 3 or more carbon atoms.