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12 条记录 (耗时 0.015 秒)

    OPTICAL SYSTEM
    1.
    发明申请
    OPTICAL SYSTEM 审中-公开

    公开(公告)号：US20190354025A1

    公开(公告)日：2019-11-21

    申请号：US16510055

    申请日：2019-07-12

    申请人： Carl Zeiss SMT GmbH

    发明人： Rolf Freimann ,  Juergen Baier ,  Steffen Fritzsche

    IPC分类号： G03F7/20 ,  G02B7/182

    摘要： The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided

    OPTICAL SYSTEM
    3.
    发明申请
    OPTICAL SYSTEM 有权

    公开(公告)号：US20220236652A1

    公开(公告)日：2022-07-28

    申请号：US17718868

    申请日：2022-04-12

    申请人： Carl Zeiss SMT GmbH

    发明人： Rolf Freimann ,  Juergen Baier ,  Steffen Fritzsche

    IPC分类号： G03F7/20 ,  G02B7/182

    摘要： The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided

    OPTICAL SYSTEM AND MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    5.
    发明申请
    OPTICAL SYSTEM AND MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微电子投影曝光装置的光学系统和多功能反射镜

    公开(公告)号：US20130100429A1

    公开(公告)日：2013-04-25

    申请号：US13715000

    申请日：2012-12-14

    申请人： Carl Zeiss SMT GmbH

    发明人： Damian Fiolka ,  Juergen Baier

    IPC分类号： G03F7/20 ,  G01B11/14 ,  G02B5/09

    CPC分类号： G03F7/70266 ,  G01B11/14 ,  G02B5/09 ,  G02B26/06 ,  G02B26/0833 ,  G02B26/0858 ,  G03F7/70133 ,  G03F7/70141

    摘要： An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.

    摘要翻译： 微光刻投影曝光装置的光学系统包括具有支撑板和多个镜面的多面反射镜。 每个镜面包括镜基底和涂覆在其上的反射涂层，并且附接到支撑板。 提供致动器，其引起支撑板的变形。 该变形改变至少两个镜面的取向和/或位置，而不改变形状。 这样可以校正像差。

    Optical system
    7.
    发明授权
    Optical system 有权

    公开(公告)号：US10386733B2

    公开(公告)日：2019-08-20

    申请号：US15835922

    申请日：2017-12-08

    申请人： Carl Zeiss SMT GmbH

    发明人： Rolf Freimann ,  Juergen Baier ,  Steffen Fritzsche

    IPC分类号： G03F7/20 ,  G02B7/182

    摘要： The disclosure provides an optical system, having a first optical control loop, which is set up to regulate a position and/or spatial orientation of a first optical element relative to a first module sensor frame, and a first module control loop, which is set up to regulate a position and/or spatial orientation of the first module sensor frame relative to a base sensor frame. Related components and methods are also provided.