公开(公告)号：US20240180014A1

公开(公告)日：2024-05-30

申请号：US18523659

申请日：2023-11-29

Applicant: CANON KABUSHIKI KAISHA

Inventor： TAKAYUKI TESHIMA

IPC: H10K71/18

CPC classification number: H10K71/18

Abstract: A resist layer containing a photoresponsive material in a photoresist is layer-transferred from a film on which the resist layer is formed to a bank substrate, and exposure and development are performed so as to remove an unexposed resist layer.

公开(公告)号：US20240174528A1

公开(公告)日：2024-05-30

申请号：US18523575

申请日：2023-11-29

Applicant: CANON KABUSHIKI KAISHA

Inventor： TAKAYUKI TESHIMA

IPC: C01G21/00

CPC classification number: C01G21/006 ,  C01P2002/34 ,  C01P2004/38 ,  C01P2004/64 ,  C01P2006/90

Abstract: A method for producing a photoresponsive nanoparticle. The method includes a first step of continuously transporting a first raw material liquid containing a lead halide and a second raw material liquid containing a fatty acid cesium to a heated mixer through a transport path, and a second step of mixing the first raw material liquid and the second raw material liquid.