公开(公告)号：US20150294845A1

公开(公告)日：2015-10-15

申请号：US14750717

申请日：2015-06-25

申请人： CANON ANELVA CORPORATION

发明人： Yoshimitsu SHIMANE ,  Satoshi UCHINO ,  Susumu AKIYAMA ,  Kazuaki MATSUO ,  Nobuo YAMAGUCHI

IPC分类号： H01J37/34

CPC分类号： H01J37/3441 ,  C23C14/34 ,  H01J37/32477 ,  H01J37/32715 ,  H01J37/32733 ,  H01J37/3405 ,  H01J37/347

摘要： An apparatus includes a process chamber, a substrate holder arranged in the process chamber, a first shield provided on the peripheral portion of the substrate holder, and a second shield provided inside the process chamber. The internal space of the process chamber is partitioned into an outer space and a process space to process the substrate, by at least the first shield, the second shield, and the substrate holder. The substrate holder can be driven along a driving direction perpendicular to a substrate holding surface. The length, in a direction parallel to the driving direction, of a minimum gap portion having a minimum size in a direction perpendicular to the driving direction between the first and second shields does not change even if the substrate holder is driven in the driving direction.

摘要翻译： 一种设备包括处理室，布置在处理室中的基板保持器，设置在基板保持器的周边部分上的第一屏蔽件和设置在处理室内部的第二屏蔽件。 处理室的内部空间被划分为外部空间和处理空间，以至少通过第一屏蔽，第二屏蔽和基板保持器来处理基板。 衬底保持器可以沿着垂直于衬底保持表面的驱动方向被驱动。 在平行于驱动方向的方向上，在垂直于第一和第二屏蔽之间的驱动方向的方向上具有最小尺寸的最小间隙部分的长度即使在驱动方向上被驱动基板保持架也不会改变。