Dye-sensitized solar cell and method for manufacturing the same
    1.
    发明授权
    Dye-sensitized solar cell and method for manufacturing the same 有权
    染料敏化太阳能电池及其制造方法

    公开(公告)号:US08143085B2

    公开(公告)日:2012-03-27

    申请号:US12361663

    申请日:2009-01-29

    IPC分类号: H01L21/00

    摘要: Provided is a dye-sensitized solar cell. Specifically, the present invention provides a dye-sensitized solar cell which is designed to reduce the production cost, improve productivity and increase energy efficiency by using a carbon electrode as a counter electrode, and a manufacturing method thereof. The dye-sensitized solar cell according to the present invention is characterized by comprising a working electrode, a counter electrode, and an electrolytic layer separating the two electrodes, wherein the counter electrode comprises a carbon electrode formed on a first transparent substrate, wherein the carbon electrode is a conductive transparent carbon electrode. According to the present invention, it is possible to remarkably reduce the production cost by using a relatively low-cost material, i.e. carbon electrode, and improve the solar cell efficiency by preventing oxidation with the electrolytic layer owing to corrosion and oxidation resistance of the carbon electrode.

    摘要翻译: 提供染料敏化太阳能电池。 具体地说,本发明提供了一种染色敏化太阳能电池及其制造方法,该染料敏化太阳能电池被设计成通过使用碳电极作为对电极来降低生产成本,提高生产率和提高能量效率。 根据本发明的染料敏化太阳能电池的特征在于包括工作电极,对电极和分离两个电极的电解质层,其中对电极包括形成在第一透明基板上的碳电极,其中碳 电极是导电透明碳电极。 根据本发明,可以通过使用相对低成本的材料即碳电极来显着降低生产成本,并且由于碳的腐蚀和抗氧化性而通过防止电解质层的氧化来提高太阳能电池的效率 电极。

    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
    3.
    发明授权
    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby 有权
    在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件

    公开(公告)号:US08329386B2

    公开(公告)日:2012-12-11

    申请号:US12704899

    申请日:2010-02-12

    IPC分类号: G03F7/26

    摘要: A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.

    摘要翻译: 提供了一种在衬底上选择性地定位纳米结构的方法,其包括:在衬底上形成光致抗蚀剂图案,然后在纳米单元中控制光致抗蚀剂图案的线宽以形成纳米光致抗蚀剂层的第一步骤; 形成用于防止在其上形成有纳米光致抗蚀剂层的基板上的未成型区域中的纳米材料的吸附的保护层的第二步骤; 去除形成在基板上的光致抗蚀剂层的第三步骤; 在去除了光致抗蚀剂层的区域中形成带正电荷或带负电荷的吸附剂层的第四步骤; 以及将在吸附剂层的相反极性上填充的含纳米材料的溶液涂布到已经形成有吸附剂层的基板上的第五步骤。

    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
    4.
    发明申请
    Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby 有权
    在衬底上组装纳米结构的方法和由此形成的纳米结构的纳米分子器件

    公开(公告)号:US20100216076A1

    公开(公告)日:2010-08-26

    申请号:US12704899

    申请日:2010-02-12

    IPC分类号: G03F7/20

    摘要: A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.

    摘要翻译: 提供了一种在衬底上选择性地定位纳米结构的方法,其包括:在衬底上形成光致抗蚀剂图案,然后在纳米单元中控制光致抗蚀剂图案的线宽以形成纳米光致抗蚀剂层的第一步骤; 形成用于防止在其上形成有纳米光致抗蚀剂层的基板上的未成型区域中的纳米材料的吸附的保护层的第二步骤; 去除形成在基板上的光致抗蚀剂层的第三步骤; 在去除了光致抗蚀剂层的区域中形成带正电荷或带负电荷的吸附剂层的第四步骤; 以及将在吸附剂层的相反极性上填充的含纳米材料的溶液涂布到已经形成有吸附剂层的基板上的第五步骤。