METHOD AND APPARATUS FOR MEASURING PARAMETERS OF OPTICAL ANISOTROPY

    公开(公告)号:US20180180531A1

    公开(公告)日:2018-06-28

    申请号:US15898400

    申请日:2018-02-16

    申请人: Axometrics, Inc.

    IPC分类号: G01N21/21 G01N21/19 G01N21/23

    CPC分类号: G01N21/21 G01N21/19 G01N21/23

    摘要: Methods and systems are provided to measure the optical anisotropy properties of a film on glass or other substrates. This technique is suitable for production environments, and is not strongly affected by the TFT or CF active area on LCD panels, even for very high pixel density displays. A method is provided for measuring a magnitude and orientation of optical anisotropy. These methods and systems include an optical anisotropy measurement apparatus for measuring anisotropic materials in a reflection or transmission configuration. The methods and systems may measure a Mueller matrix, diattentuation orientation, or retardance of a sample at one or more rotation angles to calculate anisotropic magnitude and orientation.

    Method and apparatus for measuring parameters of optical anisotropy

    公开(公告)号:US09989454B2

    公开(公告)日:2018-06-05

    申请号:US14504426

    申请日:2014-10-02

    申请人: Axometrics, Inc.

    IPC分类号: G01N21/21 G01N21/23 G01N21/19

    CPC分类号: G01N21/21 G01N21/19 G01N21/23

    摘要: Methods and systems are provided to measure the optical anisotropy properties of a film on glass or other substrates. This technique is suitable for production environments, and is not strongly affected by the TFT or CF active area on LCD panels, even for very high pixel density displays. A method is provided for measuring a magnitude and orientation of optical anisotropy. These methods and systems include an optical anisotropy measurement apparatus for measuring anisotropic materials in a reflection or transmission configuration. The methods and systems may measure a Mueller matrix, diattentuation orientation, or retardance of a sample at one or more rotation angles to calculate anisotropic magnitude and orientation.

    METHOD AND APPARATUS FOR MEASURING PARAMETERS OF OPTICAL ANISOTROPY
    3.
    发明申请
    METHOD AND APPARATUS FOR MEASURING PARAMETERS OF OPTICAL ANISOTROPY 有权
    用于测量光学异相参数的方法和装置

    公开(公告)号:US20150100277A1

    公开(公告)日:2015-04-09

    申请号:US14504426

    申请日:2014-10-02

    申请人: Axometrics, Inc.

    IPC分类号: G01N21/21

    CPC分类号: G01N21/21 G01N21/19 G01N21/23

    摘要: Methods and systems are provided to measure the optical anisotropy properties of a film on glass or other substrates. This technique is suitable for production environments, and is not strongly affected by the TFT or CF active area on LCD panels, even for very high pixel density displays. A method is provided for measuring a magnitude and orientation of optical anisotropy. These methods and systems include an optical anisotropy measurement apparatus for measuring anisotropic materials in a reflection or transmission configuration. The methods and systems may measure a Mueller matrix, diattentuation orientation, or retardance of a sample at one or more rotation angles to calculate anisotropic magnitude and orientation.

    摘要翻译: 提供了用于测量玻璃或其它基底上的膜的光学各向异性的方法和系统。 该技术适用于生产环境,并且不受LCD面板上的TFT或CF有源区域的强烈影响,即使对于非常高的像素密度显示器也是如此。 提供了一种用于测量光学各向异性的大小和取向的方法。 这些方法和系统包括用于在反射或透射结构中测量各向异性材料的光学各向异性测量装置。 方法和系统可以在一个或多个旋转角度测量样品的Mueller矩阵,疏水取向或延迟,以计算各向异性的大小和取向。