公开(公告)号：US20250157821A1

公开(公告)日：2025-05-15

申请号：US18948701

申请日：2024-11-15

Applicant: Axcelis Technologies, Inc.

Inventor： Sean Jones ,  Atul Gupta

IPC: H01L21/265 ,  H01J37/304 ,  H01J37/317 ,  H01L21/302 ,  H01L21/687

Abstract: A method for controlling workpiece deformation presents a first side of a first workpiece having an initial planarity to a first ion beam. The first ion beam deforms the first workpiece to define a first deformation of the first workpiece. A second side of the first workpiece is presented to a second ion beam to define a second deformation of the first workpiece that generally counteracts the first deformation of the first workpiece to define a final planarity of the first workpiece. The first workpiece can be a donor workpiece that is annealed after being presented to the second ion beam to define a split layer on one or more of the first and second sides of the donor workpiece. A receiver workpiece is bonded to the donor workpiece and is split from the donor workpiece to define an engineered substrate.