Adjustable implantation angle workpiece support structure for an ion beam implanter
    1.
    发明申请
    Adjustable implantation angle workpiece support structure for an ion beam implanter 失效
    用于离子束注入机的可调植入角工件支撑结构

    公开(公告)号:US20040222390A1

    公开(公告)日:2004-11-11

    申请号:US10869368

    申请日:2004-06-16

    Abstract: An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and an implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam. The ion beam implanter further includes a workpiece support structure coupled to the implantation chamber and supporting the workpiece. The workpiece support structure includes a first rotation member rotatably coupled to the implantation chamber and overlaying an opening in the implantation chamber. The workpiece support structure further includes a second rotation member rotatably coupled to the first rotation member and having a rotating shaft that protrudes through the first member and an axis of rotation offset from an axis of rotation of the first rotation member. The workpiece support structure also includes a third member fixedly attached to the second rotation member that extends into the implantation chamber, the third member including a rotatable drive supporting the workpiece having an axis of rotation offset from the axis of rotation of the first rotation member. The first rotation member, the second rotation member and the rotatable drive of the third rotation member rotate to move the workpiece along a path of travel for implantation of the implantation surface wherein a distance that the ion beam moves through the implantation chamber before striking the implantation surface of the workpiece is constant.

    Abstract translation: 离子束注入机包括用于产生沿着束线移动的离子束的离子束源和注入室,其中工件被定位成与离子束相交,用于通过离子束离子注入工件的表面。 离子束注入机还包括耦合到注入室并支撑工件的工件支撑结构。 工件支撑结构包括可旋转地联接到植入室并覆盖植入室中的开口的第一旋转构件。 工件支撑结构还包括第二旋转构件,其可旋转地联接到第一旋转构件并且具有从第一构件突出的旋转轴和从第一旋转构件的旋转轴线偏移的旋转轴。 工件支撑结构还包括固定地附接到第二旋转构件的第三构件,其延伸到注入室中,第三构件包括支撑工件的可旋转驱动装置,其具有偏离第一旋转构件的旋转轴线的旋转轴线。 第一旋转构件,第二旋转构件和第三旋转构件的可旋转驱动器旋转以沿着用于注入植入表面的移动路径移动工件,其中在撞击植入之前离子束移动通过注入室的距离 工件表面是恒定的。

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