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12 条记录 (耗时 0.016 秒)

    METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS
    5.
    发明申请
    METHOD AND APPARATUS OF ACHIEVING HIGH INPUT IMPEDANCE WITHOUT USING FERRITE MATERIALS FOR RF FILTER APPLICATIONS IN PLASMA CHAMBERS 审中-公开
    实现高输入阻抗的方法和装置，不使用铁素体材料进行射频滤波器应用于等离子体

    公开(公告)号：US20170069464A1

    公开(公告)日：2017-03-09

    申请号：US15214063

    申请日：2016-07-19

    申请人： Applied Materials, Inc.

    发明人： Zheng John YE ,  Abdul Aziz KHAJA ,  Amit Kumar BANSAL ,  Kwangduk Douglas LEE ,  Xing LIN ,  Jianhua ZHOU ,  Addepalli Sai SUSMITA ,  Juan Carlos ROCHA-ALVAREZ

    IPC分类号： H01J37/32 ,  H01L21/67 ,  C23C16/50 ,  H01L21/683

    CPC分类号： H01J37/32082 ,  C23C16/50 ,  C23C16/5096 ,  H01J37/32715 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/6831

    摘要： Implementations of the present disclosure generally relate to methods and apparatus for generating and controlling plasma, for example RF filters, used with plasma chambers. In one implementation, a plasma processing apparatus is provided. The plasma processing apparatus comprises a chamber body, a powered gas distribution manifold enclosing a processing volume and a radio frequency (RF) filter. A pedestal having a substrate-supporting surface is disposed in the processing volume. A heating assembly comprising one or more heating elements is disposed within the pedestal for controlling a temperature profile of the substrate-supporting surface. A tuning assembly comprising a tuning electrode is disposed within the pedestal between the one or more heating elements and the substrate-supporting surface. The RF filter comprises an air core inductor, wherein at least one of the heating elements, the tuning electrode, and the gas distribution manifold is electrically coupled to the RF filter.

    摘要翻译： 本公开的实施方式一般涉及用于产生和控制等离子体的方法和装置，例如与等离子体室一起使用的RF滤波器。 在一个实施方式中，提供了等离子体处理装置。 等离子体处理装置包括室主体，封闭处理容积的动力气体分配歧管和射频（RF）过滤器。 具有基板支撑表面的基座设置在处理体积中。 包括一个或多个加热元件的加热组件设置在基座内用于控制基板支撑表面的温度分布。 包括调谐电极的调谐组件设置在基座之间的一个或多个加热元件和基板支撑表面之间。 RF滤波器包括空心电感器，其中至少一个加热元件，调谐电极和气体分配歧管电耦合到RF滤波器。

    CERAMIC HEATER WITH ENHANCED RF POWER DELIVERY
    9.
    发明申请
    CERAMIC HEATER WITH ENHANCED RF POWER DELIVERY 审中-公开

    公开(公告)号：US20170278682A1

    公开(公告)日：2017-09-28

    申请号：US15463020

    申请日：2017-03-20

    申请人： Applied Materials, Inc.

    发明人： Xing LIN ,  Jianhua ZHOU ,  Ningli LIU ,  Juan Carlos ROCHA-ALVAREZ

    IPC分类号： H01J37/32 ,  C23C16/46 ,  C30B23/06 ,  C30B25/12 ,  C30B25/10 ,  C23C14/50 ,  C23C16/458

    摘要： Embodiments of the present disclosure generally relate to a substrate support assembly in a semiconductor processing chamber. The semiconductor processing chamber may be a PECVD chamber including a substrate support assembly having a substrate support and a stem coupled to the substrate support. An RF electrode is embedded in the substrate support and a rod is coupled to the RF electrode. The rod is made of titanium (Ti) or of nickel (Ni) coated with gold (Au), silver (Ag), aluminum (Al), or copper (Cu). The rod made of Ti or of Ni coated with Au, Ag, Al or Cu has a reduced electrical resistivity and increased skin depth, which minimizes heat generation as RF current travels through the rod.

    CERAMIC HEATER AND ESC WITH ENHANCED WAFER EDGE PERFORMANCE
    10.
    发明申请
    CERAMIC HEATER AND ESC WITH ENHANCED WAFER EDGE PERFORMANCE 审中-公开
    陶瓷加热器和ESC具有增强的波峰边缘性能

    公开(公告)号：US20170040198A1

    公开(公告)日：2017-02-09

    申请号：US15212695

    申请日：2016-07-18

    申请人： Applied Materials, Inc.

    发明人： Xing LIN ,  Jianhua ZHOU ,  Zheng John YE ,  Jian CHEN ,  Juan Carlos ROCHA-ALVAREZ

    IPC分类号： H01L21/683 ,  H01L21/67

    CPC分类号： H01L21/6833 ,  H01J37/32715 ,  H01L21/67103 ,  H01L21/68735

    摘要： Embodiments of the present disclosure provide an improved electrostatic chuck for supporting a substrate. The electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, a plurality of tabs projecting from the substrate supporting surface of the chuck body, wherein the tabs are disposed around the circumference of the chuck body, an electrode embedded within the chuck body, the electrode extending radially from a center of the chuck body to a region beyond the plurality of tabs, and an RF power source coupled to the electrode through a first electrical connection.

    摘要翻译： 本公开的实施例提供了用于支撑衬底的改进的静电吸盘。 静电卡盘包括联接到支撑杆的卡盘主体，卡盘主体具有基板支撑表面，从卡盘主体的基板支撑表面突出的多个突片，其中突片围绕卡盘主体的圆周设置， 嵌入在所述卡盘主体内的电极，所述电极从所述卡盘主体的中心径向延伸到超过所述多个突片的区域，以及通过第一电连接与所述电极连接的RF电源。