公开(公告)号：US20220328285A1

公开(公告)日：2022-10-13

申请号：US17496427

申请日：2021-10-07

Applicant: Applied Materials, Inc.

Inventor： Abdullah ZAFAR ,  William John DURAND ,  Xinyuan CHONG ,  Kenric CHOI ,  Weize HU ,  Kelvin CHAN ,  Amir BAYATI ,  Michelle SANPEDRO ,  Philip A. KRAUS ,  Adolph Miller ALLEN

IPC: H01J37/32 ,  G01N21/3504 ,  G01N33/00 ,  C23C16/455 ,  C23C16/52

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.

公开(公告)号：US20210032751A1

公开(公告)日：2021-02-04

申请号：US16932107

申请日：2020-07-17

Applicant: APPLIED MATERIALS, INC.

Inventor： Sarah L. WHITE ,  Elaina Noelle BABAYAN ,  Weize HU

IPC: C23C16/455

Abstract: Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.

公开(公告)号：US20250086356A1

公开(公告)日：2025-03-13

申请号：US18244113

申请日：2023-09-08

Applicant: Applied Materials, Inc.

Inventor： Adolph Miller ALLEN ,  Karthik RAMANATHAN ,  Girish VENKATACHALAPATHY ,  Umesh M. KELKAR ,  Kasturi Tulashidas SARANG ,  Yimeng LYU ,  Weize HU ,  Ying TENG ,  Sejune CHEON ,  Shiqi DONG ,  Paul Gerard KIELY ,  Milan PRAKASH

IPC: G06F30/27 ,  G05B19/418

Abstract: A method, apparatus, and system for controlling a multi-chamber system configured to process substrates are described herein. In some embodiments, a method comprises automatically determining, by each digital twin device a first data set associated with a corresponding process chamber of process chambers. The plurality of digital twin devices captures and models characteristics and processes of process chambers and generates control inputs for controlling the process chambers or processes executed by the chambers during the manufacturing of substrates. The method further comprises automatically generating, by each digital twin device, a second data set that comprises control inputs, and automatically transmitting the second data set to the process chamber.

公开(公告)号：US20250086357A1

公开(公告)日：2025-03-13

申请号：US18244126

申请日：2023-09-08

Applicant: Applied Materials, Inc.

Inventor： Adolph Miller ALLEN ,  Karthik RAMANATHAN ,  Girish VENKATACHALAPATHY ,  Umesh M. KELKAR ,  Kasturi Tulashidas SARANG ,  Yimeng LYU ,  Weize HU ,  Ying TENG ,  Sejune CHEON ,  Shiqi DONG ,  Paul Gerard KIELY ,  Milan PRAKASH

IPC: G06F30/27 ,  G05B19/418

Abstract: A method, apparatus, and system for controlling a multi-chamber process system for substrate processing are described herein. In some embodiments, a method comprises determining, by each digital twin device, of a plurality of digital twin devices, a first data set associated with at least one process chamber of a plurality of chamber processes, and the corresponding processes for processing a plurality of substrates. Each digital twin device comprises one or more computational models. The first data set comprises measurements reported by probes or sensors within the at least one chamber process, or data collected and reported by internal sensors of the digital twin device. The method further automatically generating, by each digital twin device a second data set based on, at least in part, the first data set, and by executing one or more computational models of the digital twin device.

公开(公告)号：US20250085699A1

公开(公告)日：2025-03-13

申请号：US18244104

申请日：2023-09-08

Applicant: Applied Materials, Inc.

Inventor： Adolph Miller ALLEN ,  Karthik RAMANATHAN ,  Girish VENKATACHALAPATHY ,  Umesh M. KELKAR ,  Kasturi Tulashidas SARANG ,  Yimeng LYU ,  Weize HU ,  Ying TENG ,  Sejune CHEON ,  Shiqi DONG ,  Paul Gerard KIELY ,  Milan PRAKASH

IPC: G05B19/418 ,  H01L21/67

Abstract: A method, apparatus, and system for controlling a physical twin chamber configured to process substrates are described herein. In some embodiments, a method comprises determining, by a digital twin device, characteristics of a physical twin chamber and generating control inputs for controlling the physical twin chamber. The digital twin device comprises one or more computational models for determining the characteristics of the physical twin and for generating the control inputs. The digital twin device determines a first data set associated with the physical twin chamber. The first data set comprises process data collected by sensors configured to measure attributes of the physical twin chamber. Based on the first data, the digital twin device automatically generates a second data set based on the generated control inputs and transmits the second data set to the physical twin chamber for controlling the process performed on the substrates by the physical twin chamber.