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公开(公告)号：US20210032751A1
公开(公告)日：2021-02-04
申请号：US16932107
申请日：2020-07-17
Applicant: APPLIED MATERIALS, INC.
Inventor： Sarah L. WHITE , Elaina Noelle BABAYAN , Weize HU
IPC: C23C16/455
Abstract: Methods and apparatus for controlling precursor flow are provided. In embodiments, the methods and apparatus apparatus for controlling precursor flow to a deposition chamber, includes: an ampoule to output a precursor a sensor assembly communicatively coupled to the ampoule; and a control system, wherein the control system is configured to calibrate the sensor assembly during flow of a precursor or a chemical standard through the sensor assembly.
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