公开(公告)号：US10916408B2

公开(公告)日：2021-02-09

申请号：US16790143

申请日：2020-02-13

Applicant: Applied Materials, Inc.

Inventor： Leonid Dorf ,  Evgeny Kamenetskiy ,  James Rogers ,  Olivier Luere ,  Rajinder Dhindsa ,  Viacheslav Plotnikov

IPC: H01J37/32 ,  H01L21/311 ,  H05H1/24 ,  H01L21/683

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

公开(公告)号：US10923321B2

公开(公告)日：2021-02-16

申请号：US16790086

申请日：2020-02-13

Applicant: Applied Materials, Inc.

Inventor： Leonid Dorf ,  Evgeny Kamenetskiy ,  James Rogers ,  Olivier Luere ,  Rajinder Dhindsa ,  Viacheslav Plotnikov

IPC: H01J37/32 ,  H01L21/311 ,  H05H1/24 ,  H01L21/683

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

公开(公告)号：US11699572B2

公开(公告)日：2023-07-11

申请号：US16748847

申请日：2020-01-22

Applicant: Applied Materials, Inc.

Inventor： Leonid Dorf ,  Evgeny Kamenetskiy ,  James Rogers ,  Olivier Luere ,  Rajinder Dhindsa ,  Viacheslav Plotnikov

IPC: H01J37/32 ,  H01L21/311 ,  H01L21/683

CPC classification number: H01J37/32128 ,  H01J37/32082 ,  H01J37/3299 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/31116 ,  H01J2237/3341 ,  H01L21/6831

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.

公开(公告)号：US12057292B2

公开(公告)日：2024-08-06

申请号：US18201358

申请日：2023-05-24

Applicant: Applied Materials, Inc.

Inventor： Leonid Dorf ,  Evgeny Kamenetskiy ,  James Rogers ,  Olivier Luere ,  Rajinder Dhindsa ,  Viacheslav Plotnikov

IPC: H01J37/32 ,  H01L21/311 ,  H01L21/683

CPC classification number: H01J37/32128 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32174 ,  H01J37/3299 ,  H01L21/31116 ,  H01J2237/3341 ,  H01L21/6831

Abstract: Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.