公开(公告)号：US10458861B2

公开(公告)日：2019-10-29

申请号：US15604317

申请日：2017-05-24

Applicant: Applied Materials, Inc.

Inventor： Theodore P. Moffitt ,  Naman Apurva

IPC: G01K11/12

Abstract: Embodiments disclosed herein relate to a thermal processing chamber having a substrate monitoring system. In one embodiment, a temperature monitoring system is disclosed herein. The temperature monitoring system includes a housing and a window defining an interior volume. The temperature monitoring system further includes two or more light sources, a camera, and a polarizer. The two or more light sources are disposed in the interior volume, beneath the window. A first light source of the two or more light sources has a first wavelength. A second light source of the two or more light sources has a second wavelength. A camera is disposed opposite the two or more light sources. The camera to captures a plurality of frames of two or more light beams received from the two or more light sources. The polarizer disposed in an optical path of the two or more light beams.

公开(公告)号：US09146337B2

公开(公告)日：2015-09-29

申请号：US14137592

申请日：2013-12-20

Applicant: Applied Materials, Inc.

Inventor： Jiping Li ,  Aaron Muir Hunter ,  Bruce E. Adams ,  Douglas E. Holmgren ,  Samuel C. Howells ,  Theodore P. Moffitt ,  Stephen Moffatt

IPC: G02B27/10 ,  G02B3/00 ,  G02B27/48

CPC classification number: G02B3/0037 ,  G02B27/48

Abstract: Embodiments described herein relate to thermal processing of semiconductor substrates. More specifically, embodiments described herein relate to laser thermal processing of semiconductor substrates. In certain embodiments, a uniformizer is provided to spatially and temporally decorrelate a coherent light image.

Abstract translation: 本文所述的实施例涉及半导体衬底的热处理。 更具体地，本文所述的实施例涉及半导体衬底的激光热处理。 在某些实施例中，提供均匀器来空间和时间地去相关联相干光图像。

公开(公告)号：US20150231735A1

公开(公告)日：2015-08-20

申请号：US14429597

申请日：2013-09-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Theodore P. Moffitt

IPC: B23K26/00 ,  G02B5/30

CPC classification number: B23K26/352 ,  B23K26/0604 ,  B23K26/0622 ,  B23K26/0643 ,  B23K26/0648 ,  G02B5/30 ,  G02B5/3025 ,  G02B27/283 ,  H01S3/0057

Abstract: A pulse width controller for a thermal processing system is disclosed. Pulsed electromagnetic radiation is directed through a rotatable wave plate to a polarizing beam splitter, which reflects and transmits according to the phase angle of the wave plate. Radiation transmitted by the polarizing beam splitter is directed into an optical circuit that returns the radiation to the polarizing beam splitter after a transit time. A second rotatable wave plate is positioned in the optical circuit. The polarizing beam splitter reflects and transmits the returned radiation according to the phase angle of the second rotatable wave plate. A second pulse width controller may be nested in the optical circuit, and any number of pulse width controllers may be nested.

Abstract translation: 公开了一种用于热处理系统的脉冲宽度控制器。 脉冲电磁辐射通过可旋转的波片被引导到偏振分束器，其根据波片的相位角反射和透射。 由偏振光束分离器传输的辐射被引导到在通过时间之后将辐射返回到偏振分束器的光学电路中。 第二可旋转波片位于光路中。 偏振分束器根据第二可旋转波片的相位角反射并透射返回的辐射。 第二脉冲宽度控制器可以嵌套在光学电路中，并且可以嵌套任何数量的脉冲宽度控制器。

公开(公告)号：US10537965B2

公开(公告)日：2020-01-21

申请号：US14172422

申请日：2014-02-04

Applicant: Applied Materials, Inc.

Inventor： Douglas E. Holmgren ,  Samuel C. Howells ,  Aaron Muir Hunter ,  Theodore P. Moffitt ,  Diwakar N. Kedlaya

IPC: B23K26/06 ,  H01L21/67

Abstract: Embodiments described herein relate to the rapid thermal processing of substrates. A fiber coupled laser diode array is provided in an optical system configured to generate a uniform irradiance pattern on the surface of a substrate. A plurality of individually controllable laser diodes are optically coupled via a plurality of fibers to one or more lenses. The fiber coupled laser diode array generates a Gaussian radiation profile which is defocused by the lenses to generate a uniform intensity image. In one embodiment, a field stop is disposed within the optical system.

公开(公告)号：US20150293371A1

公开(公告)日：2015-10-15

申请号：US14438706

申请日：2013-10-25

Applicant: APPLIED MATERIALS, INC.

Inventor： Daoying Song ,  Leo B. Kwak ,  Bruce E. Adams ,  Theodore P. Moffitt

IPC: G02B27/42 ,  B23K26/36 ,  G02F1/153

CPC classification number: G02B27/4233 ,  B23K26/361 ,  G02F1/153 ,  H01M4/0402 ,  H01M2010/0495 ,  H01M2220/30

Abstract: A method of fabricating an electrochemical device, comprising: depositing device layers, including electrodes and corresponding current collectors, and an electrolyte layer, on a substrate; and directly patterning at least one of said device layers by a laser light pattern generated by a laser beam incident on a diffractive optical element, the laser light pattern directly patterning at least an entire device in a single laser shot. The laser direct patterning may include, among others: die patterning of thin film electrochemical devices after all active layers have been deposited; selective ablation of cathode/anode material from corresponding current collectors; and selective ablation of electrolyte material from current collectors, Furthermore, directly patterning of the electrochemical device may be by a shaped beam generated by a laser beam incident on a diffractive optical element, and the shaped beam may be moved across the working surface of the device.

Abstract translation: 一种制造电化学装置的方法，包括：在衬底上沉积包括电极和相应的集电器的电极层和电解质层; 并且通过由入射在衍射光学元件上的激光束产生的激光图案直接图案化所述器件层中的至少一个，所述激光图案直接在单个激光照射中构图至少整个器件。 激光直接图案化可以包括：在所有活性层已经沉积之后，薄膜电化学装置的模具图案化; 从相应的集电器选择性地消融阴极/阳极材料; 以及从集电体中选择性地消融电解质材料。此外，电化学装置的直接图案化可以是通过入射在衍射光学元件上的激光束产生的成形光束，并且成形光束可以移动穿过该装置的工作表面 。

公开(公告)号：US10376991B2

公开(公告)日：2019-08-13

申请号：US14429597

申请日：2013-09-18

Applicant: Applied Materials, Inc.

Inventor： Theodore P. Moffitt

IPC: B23K26/00 ,  G02B5/30 ,  B23K26/352 ,  B23K26/06 ,  B23K26/0622 ,  H01S3/00 ,  G02B27/28

Abstract: A pulse width controller for a thermal processing system is disclosed. Pulsed electromagnetic radiation is directed through a rotatable wave plate to a polarizing beam splitter, which reflects and transmits according to the phase angle of the wave plate. Radiation transmitted by the polarizing beam splitter is directed into an optical circuit that returns the radiation to the polarizing beam splitter after a transit time. A second rotatable wave plate is positioned in the optical circuit. The polarizing beam splitter reflects and transmits the returned radiation according to the phase angle of the second rotatable wave plate. A second pulse width controller may be nested in the optical circuit, and any number of pulse width controllers may be nested.

公开(公告)号：US10114157B2

公开(公告)日：2018-10-30

申请号：US13796249

申请日：2013-03-12

Applicant: Applied Materials, Inc.

Inventor： Theodore P. Moffitt

IPC: B23K26/00 ,  G02B5/30 ,  B23K26/06 ,  B23K26/0622 ,  H01S3/00 ,  G02B27/28

Abstract: A pulse width controller for a thermal processing system is disclosed. Pulsed electromagnetic radiation is directed through a rotatable wave plate to a polarizing beam splitter, which reflects and transmits according to the phase angle of the wave plate. Radiation transmitted by the polarizing beam splitter is directed into an optical circuit that returns the radiation to the polarizing beam splitter after a transit time. A second rotatable wave plate is positioned in the optical circuit. The polarizing beam splitter reflects and transmits the returned radiation according to the phase angle of the second rotatable wave plate. A second pulse width controller may be nested in the optical circuit, and any number of pulse width controllers may be nested.