公开(公告)号：US11651932B1

公开(公告)日：2023-05-16

申请号：US17510996

申请日：2021-10-26

申请人： Applied Materials, Inc.

发明人： Alexandre Likhanskii ,  Jay T. Scheuer ,  Sudhakar Mahalingam ,  Nevin Clay

IPC分类号： H01J37/08 ,  H01J37/05 ,  H01J37/317

CPC分类号： H01J37/08 ,  H01J37/05 ,  H01J37/3171

摘要： An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.

公开(公告)号：US20230131410A1

公开(公告)日：2023-04-27

申请号：US17510996

申请日：2021-10-26

申请人： Applied Materials, Inc.

发明人： Alexandre Likhanskii ,  Jay T. Scheuer ,  Sudhakar Mahalingam ,  Nevin Clay

IPC分类号： H01J37/08 ,  H01J37/317 ,  H01J37/05

摘要： An ion source capable of extracting a ribbon ion beam with improved vertical angular uniformity is disclosed. The extraction plate and extraction optics are designed such that there is at least one non-uniform gap between adjacent components. A non-uniform gap may be effective in reducing angular spread non-uniformity of the extracted ribbon ion beam. Specifically, for a given gap in the Z direction, ions extracted from regions with lower plasma density may have more vertical angular spread. A larger gap in the Z direction between components in this region may make the vertical angular spread closer to the vertical angular spread of ions extracted from regions with higher plasma density. The non-uniform gap may be created by having an extraction plate that is flat or curved and electrodes that are flat, convex or concave. In certain embodiments, the non-uniform gap is located between the extraction plate and the suppression electrode.

公开(公告)号：US11810754B2

公开(公告)日：2023-11-07

申请号：US17546667

申请日：2021-12-09

申请人： Applied Materials, Inc.

发明人： Eric D. Hermanson ,  Nevin Clay ,  Antonella Cucchetti ,  Philip Layne ,  Sudhakar Mahalingam ,  Michael Simmons

IPC分类号： H01J37/304

CPC分类号： H01J37/3045 ,  H01J2237/2446 ,  H01J2237/24578

摘要： A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.

公开(公告)号：US20230187171A1

公开(公告)日：2023-06-15

申请号：US17546667

申请日：2021-12-09

申请人： Applied Materials, Inc.

发明人： Eric D. Hermanson ,  Nevin Clay ,  Antonella Cucchetti ,  Philip Layne ,  Sudhakar Mahalingam ,  Michael Simmons

IPC分类号： H01J37/304

CPC分类号： H01J37/3045 ,  H01J2237/2446 ,  H01J2237/24578

摘要： A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.