公开(公告)号：US20220010431A1

公开(公告)日：2022-01-13

申请号：US16923403

申请日：2020-07-08

Applicant: Applied Materials, Inc.

Inventor： Kazuya DAITO ,  Ravi JALLEPALLY ,  Harpreet SINGH

IPC: C23C16/455

Abstract: A method and apparatus for producing a gas distribution apparatus are described herein. More specifically, a method and apparatus for producing triple-channel gas distribution apparatus is described herein. The gas distribution apparatus described herein includes an upper plate, a middle plate, and a lower plate. The middle plate and the lower plate are machined before all of the upper plate, the middle plate, and the lower plate are bonded. Additional machining is then performed on the gas distribution apparatus. The gas distribution apparatus is used to distribute three or more process gases into a processing chamber.