公开(公告)号：US20140165915A1

公开(公告)日：2014-06-19

申请号：US14050196

申请日：2013-10-09

Applicant: Applied Materials, Inc.

Inventor： Govinda RAJ ,  Daniel MARTIN ,  Robert T. HIRAHARA ,  Ashish BHATNAGAR ,  Bopanna VASANTH ,  Prashanth RAO ,  Kadthala R. NARENDRNATH

IPC: H01L21/67 ,  H05B3/10

CPC classification number: H01L21/67103 ,  H01L21/68792

Abstract: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface, a heating element disposed in the heater body between the first surface and the second surface, and a thermal barrier disposed on the second surface of the heater body, wherein the thermal barrier comprises a first layer and a second layer disposed on the first layer.

Abstract translation: 提供了一种用于基板支撑加热器和相关联的室部件的装置，其具有减少的能量损失。 在一个实施例中，提供了基板支撑加热器。 衬底支撑加热器包括加热器本体，其具有用于接收衬底的第一表面和与第一表面相对的第二表面，设置在第一表面和第二表面之间的加热器本体中的加热元件，以及设置在第二表面上的热障壁 所述加热器主体的表面，其中所述热障包括设置在所述第一层上的第一层和第二层。