公开(公告)号：US10886155B2

公开(公告)日：2021-01-05

申请号：US16249653

申请日：2019-01-16

Applicant: Applied Materials, Inc.

Inventor： Mingwei Zhu ,  Zihao Yang ,  Nag B. Patibandla ,  Daniel Lee Diehl ,  Yong Cao ,  Weimin Zeng ,  Renjing Zheng ,  Edward Budiarto ,  Surender Kumar Gurusamy ,  Todd Egan ,  Niranjan R. Khasgiwale

IPC: H01L21/67 ,  H01L21/687 ,  G01N21/21

Abstract: A method and apparatus for forming an optical stack having uniform and accurate layers is provided. A processing tool used to form the optical stack comprises, within an enclosed environment, a first transfer chamber, an on-board metrology unit, and a second transfer chamber. A first plurality of processing chambers is coupled to the first transfer chamber or the second transfer chamber. The on-board metrology unit is disposed between the first transfer chamber and the second transfer chamber. The on-board metrology unit is configured to measure one or more optical properties of the individual layers of the optical stack without exposing the layers to an ambient environment.