公开(公告)号：US20230187166A1

公开(公告)日：2023-06-15

申请号：US17547623

申请日：2021-12-10

Applicant: Applied Materials, Inc.

Inventor： Robert Mitchell ,  Frank Sinclair ,  Joseph C. Olson ,  William T. Weaver ,  Nick Parisi

IPC: H01J37/20 ,  H01J37/317 ,  H01L21/683 ,  C23C14/48 ,  C23C14/50

CPC classification number: H01J37/20 ,  H01J37/3171 ,  H01L21/6833 ,  C23C14/48 ,  C23C14/505 ,  H01J2237/20214

Abstract: A system comprising a spinning disk is disclosed. The system comprises a semiconductor processing system, such as a high energy implantation system. The semiconductor processing system produces a spot ion beam, which is directed to a plurality of workpieces, which are disposed on the spinning disk. The spinning disk comprises a rotating central hub with a plurality of platens. The plurality of platens may extend outward from the central hub and workpieces are electrostatically clamped to the platens. The plurality of platens may also be capable of rotation. The central hub also controls the rotation of each of the platens about an axis orthogonal to the rotation axis of the central hub. In this way, variable angle implants may be performed. Additionally, this allows the workpieces to be mounted while in a horizontal orientation.

公开(公告)号：US12002649B2

公开(公告)日：2024-06-04

申请号：US17547623

申请日：2021-12-10

Applicant: Applied Materials, Inc.

Inventor： Robert Mitchell ,  Frank Sinclair ,  Joseph C. Olson ,  William T. Weaver ,  Nick Parisi

IPC: H01J37/20 ,  C23C14/48 ,  C23C14/50 ,  H01J37/317 ,  H01L21/683

CPC classification number: H01J37/20 ,  C23C14/48 ,  C23C14/505 ,  H01J37/3171 ,  H01L21/6833 ,  H01J2237/20214

Abstract: A system comprising a spinning disk is disclosed. The system comprises a semiconductor processing system, such as a high energy implantation system. The semiconductor processing system produces a spot ion beam, which is directed to a plurality of workpieces, which are disposed on the spinning disk. The spinning disk comprises a rotating central hub with a plurality of platens. The plurality of platens may extend outward from the central hub and workpieces are electrostatically clamped to the platens. The plurality of platens may also be capable of rotation. The central hub also controls the rotation of each of the platens about an axis orthogonal to the rotation axis of the central hub. In this way, variable angle implants may be performed. Additionally, this allows the workpieces to be mounted while in a horizontal orientation.