公开(公告)号：US20210305011A1

公开(公告)日：2021-09-30

申请号：US16828218

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Jonathan Gerald England ,  Joseph C. Olson

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.

公开(公告)号：US11387073B2

公开(公告)日：2022-07-12

申请号：US16828218

申请日：2020-03-24

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Jonathan Gerald England ,  Joseph C. Olson

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/317 ,  H01J37/141

Abstract: A system and method that is capable of measuring the incident angle of an ion beam, especially an ion beam comprising heavier ions, is disclosed. In one embodiment, X-rays, rather than ions, are used to determine the channeling direction. In another embodiment, the workpiece is constructed, at least in part, of a material having a high molecular weight such that heaver ion beams can be measured. Further, in another embodiment, the parameters of the ion beam are measured across an entirety of the beam, allowing components of the ion implantation system to be further tuned to create a more uniform beam.