专利检索 ap:("Applied Materials, Inc.") AND inv:"Eric SHONO" 第 1 页

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发明申请
PROCESSING SYSTEM AND METHOD OF DELIVERING A REACTANT GAS 有权

公开(公告)号：US20220411927A1

公开(公告)日：2022-12-29

申请号：US17753524

申请日：2020-09-09

申请人： Applied Materials, Inc.

发明人： Vishwas Kumar PANDEY , Christopher OLSEN , Rene GEORGE , Eric SHONO , Lara HAWRYLCHAK , Erika HANSEN , Tobin KAUFMAN-OSBORN , Hansel LO , Kartik SHAH

IPC分类号： C23C16/455 , H01L21/67 , C23C16/40 , C23C16/52 , C23C16/458

摘要： Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.