公开(公告)号：US20150099437A1

公开(公告)日：2015-04-09

申请号：US14505231

申请日：2014-10-02

Applicant: Applied Materials, Inc.

Inventor： Daniel L. MARTIN ,  Jeonghoon OH ,  Simon YAVELBERG

IPC: B24B37/32 ,  C23C16/02 ,  C23C16/455

CPC classification number: B24B37/32 ,  B05D1/08 ,  B05D1/60 ,  B05D7/52 ,  C09D127/18 ,  C09D165/04

Abstract: A retaining ring for a polishing system is disclosed. The retaining ring has a process-resistant coating over a portion thereof. The process-resistant coating is a thin, smooth, conformal layer that is resistant to wear and chemical attack. The process-resistant coating is formed by a method that includes vapor deposition from a precursor gas mixture, which may deposit polyparaxyxylene from a gas mixture comprising paracyclophane. Adhesion of the process-resistant coating to the retaining ring may be enhanced by treating the surface of the ring prior to forming the coating. Resistance of the coating to the process may be further enhanced by treating the surface of the coating with an etching or deposition gas to impart texture.

Abstract translation: 公开了一种用于抛光系统的保持环。 保持环在其一部分上具有耐加工涂层。 耐加工涂层是一种薄而光滑的共形层，耐磨损和化学侵蚀。 耐加工涂层通过包括从前体气体混合物的气相沉积的方法形成，前体气体混合物可以从包含对环磷烷的气体混合物中沉积聚对二甲苯。 可以通过在形成涂层之前处理环的表面来增强耐保护涂层对保持环的粘合性。 通过用蚀刻或沉积气体处理涂层的表面以赋予纹理，可以进一步提高涂层对该方法的耐受性。