公开(公告)号：US20200166834A1

公开(公告)日：2020-05-28

申请号：US16685164

申请日：2019-11-15

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Eli DAGAN ,  Khalid MAKHAMREH ,  Bruce J. FENDER

IPC: G03F1/66 ,  G03F1/22

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.

公开(公告)号：US20200183268A1

公开(公告)日：2020-06-11

申请号：US16661541

申请日：2019-10-23

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Eli DAGAN ,  Khalid MAKHAMREH ,  Bruce J. FENDER

IPC: G03F1/82 ,  G03F7/20

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for removing an attachment feature utilized to hold a pellicle from a photomask. In one embodiment, an attachment feature removal apparatus for processing a photomask includes an attachment feature puller comprising an actuator, a clamp coupled to the actuator, the clamp adapted to grip an attachment feature, and a coil assembly disposed adjacent to the attachment feature.