公开(公告)号：US20180138408A1

公开(公告)日：2018-05-17

申请号：US15112121

申请日：2015-08-05

Applicant: Applied Materials, Inc.

Inventor： Brian E. LASSITER ,  Dieter HAAS ,  Xi HUANG

IPC: H01L51/00 ,  C23C14/04 ,  C25D1/10 ,  C25D1/20 ,  H01L51/56

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/56 ,  C25D1/10 ,  C25D1/20 ,  H01L51/56

Abstract: A shadow mask (200) includes a frame (210) made of a metallic material, and one or more mask patterns (205) coupled to the frame (210), the one or more mask patterns (205) comprising a metallic material having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings (215) formed therein, the metallic material having a thickness of about 5 microns to about 50 microns and having a pitch tolerance between openings (215) of about +/−3 microns across a length of about 160 millimeters.

公开(公告)号：US20210214834A1

公开(公告)日：2021-07-15

申请号：US15733833

申请日：2018-06-26

Applicant: Applied Materials, Inc.

Inventor： Xi HUANG ,  Byung-Sung KWAK ,  Christopher Dennis BENCHER ,  Dieter HAAS ,  Brian E. LASSITER

IPC: C23C14/04 ,  C23C14/12 ,  C23C14/24 ,  C25D1/10

Abstract: Embodiments of the disclosure provide methods and apparatus for a shadow mask. In one embodiment, a shadow mask is provided and includes a frame made of a metallic material, and one or more mask patterns coupled to the frame, the one or more mask patterns comprising a metal having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings formed therein, the metal having a thickness of about 5 microns to about 50 microns and having borders formed therein each defining a fine opening having a recessed surface formed on a substrate contact surface thereof, wherein each of the one or more mask patterns have a flatness of less than about 150 microns across a surface area of about 70,000 square millimeters.

公开(公告)号：US20190036026A1

公开(公告)日：2019-01-31

申请号：US16073826

申请日：2016-02-03

Applicant: Applied Materials, Inc.

Inventor： Xi HUANG ,  Brian E. LASSITER ,  Christopher Dennis BENCHER ,  Dieter HAAS

IPC: H01L51/00 ,  C23C14/04 ,  C23C14/24 ,  C23C14/12 ,  C25D1/10 ,  C25D1/00

Abstract: Disclosed are methods and apparatus for a shadow mask. A shadow mask (200), comprising: a frame (210) made of a metallic material, and one or more mask patterns (205) coupled to the frame (210), the one or more mask patterns (205) comprising a metal having a coefficient of thermal expansion less than or equal to about 14 microns/meter/degrees Celsius and having a plurality of openings (215) formed therein, the metal having a thickness of about 5 microns to about 50 microns and having borders (355) formed therein each defining a fine opening (215) having a recessed surface (370) formed on a substrate contact surface (375) thereof.

公开(公告)号：US20190036027A1

公开(公告)日：2019-01-31

申请号：US16073833

申请日：2016-02-03

Applicant: Applied Materials, Inc. ,  Maxell Holdings, Ltd.

Inventor： Brian E. LASSITER ,  Xi HUANG ,  Dieter HAAS ,  Ryogo HONDA ,  Takashi NAKASHIMA

IPC: H01L51/00 ,  C25D1/10 ,  C25D1/00 ,  C23C14/24 ,  C23C14/04 ,  C23C14/12

Abstract: Methods and apparatus (400) for a shadow mask are provided. A mask pattern (302) includes a mandrel (305) comprising a material having a coefficient of thermal expansion less than or equal to about 7 microns/meter/degrees Celsius with a conductive material formed thereon, and a dielectric material (310) having a plurality of openings (318) formed therein exposing at least portion of the conductive material. The dielectric material (310) comprises a pattern of volumes, each of the volumes has a major dimension of about 5 microns to about 20 microns.