公开(公告)号：US20150114948A1

公开(公告)日：2015-04-30

申请号：US14505355

申请日：2014-10-02

Applicant: Applied Materials, Inc.

Inventor： Robin L. TINER ,  Soo Young CHOI ,  Beom Soo PARK ,  Shinichi KURITA ,  Bora OH ,  Gaku FURUTA

IPC: C23C16/458 ,  H05B3/22 ,  H01L21/67

CPC classification number: H05B3/22 ,  C23C16/458 ,  C23C16/4586 ,  C23C16/50 ,  H01L21/67103 ,  H05B2203/003

Abstract: The present invention generally relates to a substrate support for use in a processing chamber. The substrate support is divided into quadrants with each quadrant capable of heating independent of the other quadrants. The independent heating permits the substrate support to provide different heating to either different substrate simultaneously disposed on the substrate support or to different areas of a common substrate. Thus, the substrate heating may be tailored to ensure desired processing of the substrate or substrates occurs.

Abstract translation: 本发明一般涉及一种用于处理室中的基片支架。 衬底支撑分为象限，每个象限能够独立于其他象限进行加热。 独立加热允许衬底支撑件向同时设置在衬底支撑件上的不同衬底或公共衬底的不同区域提供不同的加热。 因此，可以调整基板加热以确保发生基板或基板的期望的处理。

公开(公告)号：US20170231033A1

公开(公告)日：2017-08-10

申请号：US15496405

申请日：2017-04-25

Applicant: Applied Materials, Inc.

Inventor： Robin L. TINER ,  Soo Young CHOI ,  Beom Soo PARK ,  Shinichi KURITA ,  Bora OH ,  Gaku FURUTA

IPC: H05B3/22 ,  C23C16/458 ,  H01L21/67 ,  C23C16/50

CPC classification number: H05B3/22 ,  C23C16/458 ,  C23C16/4586 ,  C23C16/50 ,  H01L21/67103 ,  H05B2203/003

Abstract: The present invention generally relates to a substrate support for use in a processing chamber. The substrate support has a rectangular body. The rectangular body has a first quadrant, a second quadrant, a third quadrant and a fourth quadrant. A first heating element is disposed in the first quadrant and extending from a center area of the rectangular body. The first heating element has a first segment having a first length and extending from the center area, a second segment having a second length, the second segment extending from the first segment and coupled thereto, a third segment having a third length extending from the second segment and coupled thereto, and a fourth segment having a fourth length coupled to and extending from the third segment to the center area. A second heating element is enclosed by the first heating element and the center area.