公开(公告)号：US20220004689A1

公开(公告)日：2022-01-06

申请号：US17479423

申请日：2021-09-20

Applicant: Applied Materials, Inc.

Inventor： Bhuvaneshwari Ayyagari ,  Angada Bangalore Sachid

IPC: G06F30/3308 ,  G06F30/20

Abstract: A complete, unified material-to-systems simulation, design, and verification method for semiconductor design and manufacturing may include evaluating effects of semiconductor material or process changes on software algorithms. The method may include generating primitive circuit structures using the material or process changes; performing an electrical characterization of the primitive circuit structures; providing an output of the electrical characterization to a script to generate compact models; generating a digital system based on the compact models; and evaluating a performance of a software algorithm on the digital system to determine an effect of the material or process change for the semiconductor manufacturing process.

公开(公告)号：US11763052B2

公开(公告)日：2023-09-19

申请号：US17479423

申请日：2021-09-20

Applicant: Applied Materials, Inc.

Inventor： Bhuvaneshwari Ayyagari ,  Angada Bangalore Sachid

IPC: G06F30/33 ,  G06F30/3308 ,  G06F30/20

CPC classification number: G06F30/3308 ,  G06F30/20

Abstract: A complete, unified material-to-systems simulation, design, and verification method for semiconductor design and manufacturing may include evaluating effects of semiconductor material or process changes on software algorithms. The method may include generating primitive circuit structures using the material or process changes; performing an electrical characterization of the primitive circuit structures; providing an output of the electrical characterization to a script to generate compact models; generating a digital system based on the compact models; and evaluating a performance of a software algorithm on the digital system to determine an effect of the material or process change for the semiconductor manufacturing process.

公开(公告)号：US11126769B2

公开(公告)日：2021-09-21

申请号：US16781980

申请日：2020-02-04

Applicant: Applied Materials, Inc.

Inventor： Bhuvaneshwari Ayyagari ,  Angada Bangalore Sachid

IPC: G06F30/3308 ,  G06F30/20

Abstract: A complete, unified material-to-systems simulation, design, and verification method for semiconductor design and manufacturing may include evaluating effects of semiconductor material or process changes on software algorithms. The method may include translating the material or process change into a database of characteristics; generating primitive circuit structures using the database of characteristics; performing an electrical characterization of the primitive circuit structures; providing an output of the electrical characterization to a script to generate compact models; generating a lite version of standard cells; generating a digital system based on the lite version of the standard cells; and evaluating a performance of a software algorithm on the digital system to determine an effect of the material or process change for the semiconductor manufacturing process.

公开(公告)号：US20210240896A1

公开(公告)日：2021-08-05

申请号：US16781980

申请日：2020-02-04

Applicant: Applied Materials, Inc.

Inventor： Bhuvaneshwari Ayyagari ,  Angada Bangalore Sachid

IPC: G06F30/3308 ,  G06F30/20

Abstract: A complete, unified material-to-systems simulation, design, and verification method for semiconductor design and manufacturing may include evaluating effects of semiconductor material or process changes on software algorithms. The method may include translating the material or process change into a database of characteristics; generating primitive circuit structures using the database of characteristics; performing an electrical characterization of the primitive circuit structures; providing an output of the electrical characterization to a script to generate compact models; generating a lite version of standard cells; generating a digital system based on the lite version of the standard cells; and evaluating a performance of a software algorithm on the digital system to determine an effect of the material or process change for the semiconductor manufacturing process.

公开(公告)号：US20240281584A1

公开(公告)日：2024-08-22

申请号：US18170335

申请日：2023-02-16

Applicant: Applied Materials, Inc.

Inventor： Martinus Maria Berkens ,  Bhuvaneshwari Ayyagari ,  Simon Johannes Klaver ,  Vinod Reddy ,  Rene Gerardus Maria Beugels ,  Andres Llopis Lozano

IPC: G06F30/337 ,  G06F30/392

CPC classification number: G06F30/337 ,  G06F30/392

Abstract: A method of automatically generating standard cells may include receiving a definition of a circuit for a standard cell. The definition may include one or more semiconductor devices. The method may also include identifying a plurality of slices that implement a device in the one or more semiconductor devices. Each of the plurality of slices may include a partial layout for the device. The method may further include combining more than one of the plurality of slices into a combined layout to implement the device when forming the standard cell.