公开(公告)号：US11609505B2

公开(公告)日：2023-03-21

申请号：US17222696

申请日：2021-04-05

Applicant: Applied Materials, Inc.

Inventor： Mangesh Ashok Bangar ,  Gautam Pisharody ,  Lancelot Huang ,  Alan L. Tso ,  Douglas A. Buchberger, Jr. ,  Huixiong Dai ,  Dmitry Lubomirsky ,  Srinivas D. Nemani ,  Christopher Siu Wing Ngai

IPC: G03F7/20 ,  G01N27/10

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for verification and re-use of process fluids. The apparatus generally includes a tool for performing lithography, and a recirculation path coupled to the tool. The recirculation path generally includes a collection unit coupled at first end to a first end of the tool, and a probe coupled at a first end to a second end of the collection unit, the probe for determining one or more characteristics of a fluid flowing from the tool. The recirculation path of the apparatus further generally includes a purification unit coupled at a first end to a third end of the collection unit, the purification unit further coupled at a second end to a second end of the probe, the purification unit for changing a characteristic of the fluid.