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公开(公告)号:US09530174B2
公开(公告)日:2016-12-27
申请号:US14503311
申请日:2014-09-30
Applicant: Apple Inc.
Inventor: Umesh Suresh Vaishampayan , Derek R. Kumar , Cecile Marie Foret , Anthony Graham Sumpter , Harshavardhan P. Gopalakrishnan , William E. Damon, III
CPC classification number: G06T1/20 , G06F1/206 , G06F9/4893 , G06T2200/28 , G09G5/363 , G09G2320/041 , G09G2330/021 , Y02D10/16
Abstract: A method and apparatus of a device that manages a thermal profile of a device by selectively throttling graphics processing unit operations of the device is described. In an exemplary embodiment, the device monitors the thermal profile of the device, where the device executes a plurality of processes that utilizes a graphics processing unit of the device. In addition, the plurality of processes include a high priority process and a low priority process. If the thermal profile of the device exceeds a thermal threshold, the device decreases a first GPU utilization for the low priority process and maintains a second GPU utilization for the high priority process. The device further executes the low priority process using the first GPU utilization with the GPU and executes the high priority process using the second GPU utilization with the GPU.
Abstract translation: 描述了通过选择性地节流设备的图形处理单元操作来管理设备的热轮廓的设备的方法和装置。 在示例性实施例中,设备监视设备的热剖面,其中设备执行利用设备的图形处理单元的多个处理。 另外,多个处理包括高优先级处理和低优先级处理。 如果设备的热分布超过热阈值,则设备会降低低优先级进程的第一GPU利用率,并为高优先级进程维护第二GPU利用率。 该设备还使用GPU的第一GPU利用率执行低优先级进程,并且使用与GPU的第二GPU利用率执行高优先级进程。
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公开(公告)号:US20150348226A1
公开(公告)日:2015-12-03
申请号:US14503311
申请日:2014-09-30
Applicant: Apple Inc.
Inventor: Umesh Suresh Vaishampayan , Derek R. Kumar , Cecile Marie Foret , Anthony Graham Sumpter , Harshavardhan P. Gopalakrishnan , William E. Damon, III
IPC: G06T1/20
CPC classification number: G06T1/20 , G06F1/206 , G06F9/4893 , G06T2200/28 , G09G5/363 , G09G2320/041 , G09G2330/021 , Y02D10/16
Abstract: A method and apparatus of a device that manages a thermal profile of a device by selectively throttling graphics processing unit operations of the device is described. In an exemplary embodiment, the device monitors the thermal profile of the device, where the device executes a plurality of processes that utilizes a graphics processing unit of the device. In addition, the plurality of processes include a high priority process and a low priority process. If the thermal profile of the device exceeds a thermal threshold, the device decreases a first GPU utilization for the low priority process and maintains a second GPU utilization for the high priority process. The device further executes the low priority process using the first GPU utilization with the GPU and executes the high priority process using the second GPU utilization with the GPU.
Abstract translation: 描述了通过选择性地节流设备的图形处理单元操作来管理设备的热轮廓的设备的方法和装置。 在示例性实施例中,设备监视设备的热剖面,其中设备执行利用设备的图形处理单元的多个处理。 另外,多个处理包括高优先级处理和低优先级处理。 如果设备的热分布超过热阈值,则设备会降低低优先级进程的第一GPU利用率,并为高优先级进程维护第二GPU利用率。 该设备还使用GPU的第一GPU利用率执行低优先级进程,并且使用与GPU的第二GPU利用率执行高优先级进程。
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