公开(公告)号：US20240181568A1

公开(公告)日：2024-06-06

申请号：US18117146

申请日：2023-03-03

申请人： ASUSTEK COMPUTER INC.

发明人： Yun-Wei TSAI ,  Hsien-Yeh CHEN ,  Shu-Man HU ,  Chin-Yun LEE ,  Yi-Chang WU ,  Yen-Hsun LIN ,  Kuo-Wei TSAO ,  Chi-Liang TSAI

IPC分类号： B23K26/352 ,  C01B32/184 ,  C04B41/00 ,  C04B41/45 ,  C04B41/50 ,  C04B41/87 ,  C08G61/02 ,  H01J37/32

CPC分类号： B23K26/352 ,  C01B32/184 ,  C04B41/0036 ,  C04B41/0072 ,  C04B41/4531 ,  C04B41/4554 ,  C04B41/5003 ,  C04B41/87 ,  C08G61/025 ,  H01J37/32522 ,  H01J37/32743 ,  C08G2261/11 ,  H01J2237/338

摘要： A method for producing graphene, configured for forming a graphene layer on a surface of an object. The method includes steps of: depositing a poly-p-xylene material layer on the surface: and converting the poly-p-xylene material layer into a graphene layer by using a laser sintering process or a plasma-assisted sintering process.