公开(公告)号：US10578963B2

公开(公告)日：2020-03-03

申请号：US15959968

申请日：2018-04-23

申请人： ASML US, LLC

发明人： Yuan He ,  Jie Lin ,  Jihui Huang

IPC分类号： G06F17/50 ,  G03F1/70 ,  G03F1/76

摘要： Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.

公开(公告)号：US10705420B2

公开(公告)日：2020-07-07

申请号：US15979751

申请日：2018-05-15

申请人： ASML US, LLC

发明人： Song Lan ,  Ke Zhao ,  Yang Cao ,  Jihui Huang

IPC分类号： G06F17/50 ,  G03F1/70 ,  G03F1/36 ,  G03F1/20 ,  G06T7/00

摘要： Directly biasing a mask image is disclosed. A method includes generating a mask image for the mask, biasing the mask image to obtain a biased mask image, and simulating the biased mask image to obtain a wafer image to be compared to the design pattern. Biasing the mask image includes updating at least one pixel of the mask image using an interpolation of neighboring pixels of the at least one pixel, the interpolation being dependent on a predetermined value.

公开(公告)号：US10656530B2

公开(公告)日：2020-05-19

申请号：US15973809

申请日：2018-05-08

申请人： ASML US, LLC

发明人： Jihui Huang ,  Ke Zhao ,  Jiangwei Li

IPC分类号： G06F17/50 ,  G03F7/20

摘要： Extracting shapes from a pixelated SRAF bitmap image of pixels for mask making is disclosed. A method includes receiving the pixelated SRAF bitmap image of pixels, each pixel having a respective brightness value; selecting a ridge point in the pixelated SRAF bitmap image; for each pixel of at least some of the pixels, determining a respective arrival time at the pixel; and determining a mask shape using the arrival times of the at least some of the pixels. The ridge point is one of the pixels and is selected based on the respective brightness value of the one of the pixels. An arrival time is based on a respective brightness value of the pixel and a Mask Rule Check (MRC) rule.

公开(公告)号：US20200096876A1

公开(公告)日：2020-03-26

申请号：US16141197

申请日：2018-09-25

申请人： ASML US, LLC f/k/a ASML US, INC.

发明人： Jie Lin ,  Jiangwei Li ,  Song Lan ,  Ke Zhao ,  Jihui Huang

IPC分类号： G03F7/20 ,  G03F1/78

摘要： A method and a non-transitory computer-readable storage medium for optimizing a dose map for a multi-beam mask writer includes simulating, by a processor, a substrate pattern based on a design pattern and the dose map associated with the design pattern, and updating a value of the dose map based on a comparison between the substrate pattern and the design pattern. An apparatus for optimizing a dose map for a multi-beam mask writer includes a processor and a memory coupled to the processor configured to store instructions to simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern, and update a value of the dose map based on a comparison between the substrate pattern and the design pattern.