公开(公告)号：US20200096876A1

公开(公告)日：2020-03-26

申请号：US16141197

申请日：2018-09-25

申请人： ASML US, LLC f/k/a ASML US, INC.

发明人： Jie Lin ,  Jiangwei Li ,  Song Lan ,  Ke Zhao ,  Jihui Huang

IPC分类号： G03F7/20 ,  G03F1/78

摘要： A method and a non-transitory computer-readable storage medium for optimizing a dose map for a multi-beam mask writer includes simulating, by a processor, a substrate pattern based on a design pattern and the dose map associated with the design pattern, and updating a value of the dose map based on a comparison between the substrate pattern and the design pattern. An apparatus for optimizing a dose map for a multi-beam mask writer includes a processor and a memory coupled to the processor configured to store instructions to simulate a substrate pattern based on a design pattern and the dose map associated with the design pattern, and update a value of the dose map based on a comparison between the substrate pattern and the design pattern.