公开(公告)号：US11703768B2

公开(公告)日：2023-07-18

申请号：US17600340

申请日：2020-03-10

Applicant: ASML Netherlands B.V.

Inventor： Alisia Mariska Willems-Peters ,  Sander Baltussen ,  Zhuangxiong Huang ,  Reinier Theodorus Martinus Jilisen ,  Sietse Wijtvliet

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70775 ,  G03F7/70916 ,  G03F7/70933

Abstract: An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.

公开(公告)号：US12158705B2

公开(公告)日：2024-12-03

申请号：US17909348

申请日：2021-03-01

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Joseph Harry Lyons ,  Jimi Hendriks ,  Ping Zhou ,  Zhuangxiong Huang ,  Reinier Theodorus Martinus Jilisen

IPC: G03F7/00

Abstract: Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

公开(公告)号：US12292696B2

公开(公告)日：2025-05-06

申请号：US18008409

申请日：2021-04-30

Applicant: ASML Netherlands B.V.

Inventor： José Nilton Fonseca Junior ,  Franciscus Johannes Leonardus Heutz ,  Zhuangxiong Huang ,  Ferdy Migchelbrink

IPC: G03F7/20 ,  G02B27/00 ,  G03F7/00

Abstract: The present invention provides a fluid purging system (100) for an optical element (30), comprising a ring and a fluid supply system (40). The ring being formed of a body entirely surrounding the optical element, the ring defining a space (5) radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion (10) and at least one second wall portion (20A; 20B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.