公开(公告)号：US11703768B2

公开(公告)日：2023-07-18

申请号：US17600340

申请日：2020-03-10

Applicant: ASML Netherlands B.V.

Inventor： Alisia Mariska Willems-Peters ,  Sander Baltussen ,  Zhuangxiong Huang ,  Reinier Theodorus Martinus Jilisen ,  Sietse Wijtvliet

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70775 ,  G03F7/70916 ,  G03F7/70933

Abstract: An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.