公开(公告)号：US20160313656A1

公开(公告)日：2016-10-27

申请号：US15104212

申请日：2014-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Youri Johannes Laurentius Maria VAN DOMMELEN ,  Peter David ENGBLOM ,  Lambertus Gerardus Maria KESSELS ,  Arie Jeffrey DEN BOEF ,  Kaustuve BHATTACHARYYA ,  Paul Christiaan HINNEN ,  Marco Johannes Annemarie PIETERS

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70683

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

Abstract translation: 一种用于获得与光刻工艺相关的焦点信息的方法和装置。 该方法包括照亮目标，目标具有交替的第一和第二结构，其中第二结构的形式是聚焦依赖的，而第一结构的形式不具有与第二结构相同的焦点依赖性，并且检测 由目标重定向的辐射以为该目标获得表示目标的总体不对称性的不对称测量，其中不对称测量指示形成目标的波束的焦点。 用于形成这种靶的相关掩模和具有这种靶的基片。

公开(公告)号：US20180253018A1

公开(公告)日：2018-09-06

申请号：US15968743

申请日：2018-05-01

Applicant: ASML Netherlands B.V.

Inventor： Youri Johannes Laurentius Maria VAN DOMMELEN ,  Peter David Engblom ,  Lambertus Gerardus Maria Kessels ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Paul Christiaan Hinnen ,  Marco Johannes Annemarie Pieters

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70683

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

公开(公告)号：US20140233025A1

公开(公告)日：2014-08-21

申请号：US14264547

申请日：2014-04-29

Applicant: ASML, Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan BLEEKER ,  Youri Johannes Laurentius Maria VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cedric Desire GROUWSTRA ,  Markus Gerardus Martinus VAN KRAAIJ

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Abstract translation: 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。