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公开(公告)号：US20240085379A1
公开(公告)日：2024-03-14
申请号：US18268467
申请日：2021-12-15
Applicant: ASML Netherlands B.V.
Inventor： Mustafa Ümit ARABUL , Zili ZHOU , Willem Marie,Julia,Marcel COENE , Coen Adrianus VERSCHUREN , Paul, Louis,Maria Joseph VAN NEER , Daniele PIRAS , Sandra BLAAK , Wouter Dick KOEK , Robert Wilhelm WILLEKERS
CPC classification number: G01N29/04 , G01N29/262 , G01N29/28 , G01N2291/023 , G01N2291/106
Abstract: A metrology apparatus for determining one or more parameters of a structure fabricated in or on a semiconductor substrate. The apparatus comprises a transducer array comprising a plurality of transducers positioned in a plane. The plurality of transducers comprises at least one transmitter transducer for emitting acoustic radiation in a frequency range from 1 GHz to 100 GHz towards the structure, and at least one receiver transducer for receiving acoustic radiation reflected and/or diffracted from the structure.
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公开(公告)号：US20250067768A1
公开(公告)日：2025-02-27
申请号：US18724551
申请日：2022-12-22
Applicant: ASML Netherlands B.V.
Inventor： Mustafa Ümit ARABUL , Zili ZHOU , Nitesh PANDEY , Coen Adrianus VERSCHUREN , Willem Marie Julia Marcel COENE , Gerard Jan VERBIEST , Peter Gerard STEENEKEN , Martin Pierre ROBIN
Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.
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