公开(公告)号：US10310386B2

公开(公告)日：2019-06-04

申请号：US15325428

申请日：2015-06-29

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Feng-Liang Liu

IPC: G06F17/50 ,  G03F7/20 ,  G03F1/70 ,  G03F1/36

Abstract: Methods of reducing a pattern displacement error, contrast loss, best focus shift, and/or tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing one or more assist features onto, or adjusting a position and/or shape of one or more existing assist features in, the portion. Adjusting the illumination source and/or the one or more assist features may be by an optimization algorithm.

公开(公告)号：US11054750B2

公开(公告)日：2021-07-06

申请号：US15023330

申请日：2014-09-11

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Rafael C. Howell ,  Feng-Liang Liu

IPC: G03F7/20

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illuminator and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination produced by the illuminator and of the design layout, wherein the multi-variable cost function is a function of a three-dimensional resist profile on the substrate, or a three-dimensional radiation field projected from the projection optics, or both; and reconfiguring one or more characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.

公开(公告)号：US10955755B2

公开(公告)日：2021-03-23

申请号：US16428373

申请日：2019-05-31

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Feng-Liang Liu

IPC: G06F30/30 ,  G03F7/20 ,  G03F1/70 ,  G06F30/398 ,  G03F1/36

Abstract: Disclosed herein are several methods of reducing one or more pattern displacement errors, contrast loss, best focus shift , tilt of a Bossung curve of a portion of a design layout used in a lithographic process for imaging that portion onto a substrate using a lithographic apparatus. The methods include adjusting an illumination source of the lithographic apparatus, placing assist features onto or adjusting positions and/or shapes existing assist features in the portion. Adjusting the illumination source and/or the assist features may be by an optimization algorithm.