公开(公告)号：US20210356875A1

公开(公告)日：2021-11-18

申请号：US17282029

申请日：2019-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost DE HOOGH ,  Alain Louis Claude LEROUX ,  Alexander Marinus Arnoldus HUIJBERTS ,  Christiaan Louis VALENTIN ,  Robert Coenraad WIT ,  Dries Vaast Paul HEMSCHOOTE ,  Frits VAN DER MEULEN ,  Johannes Franciscus Martinus VAN SANTVOORT ,  Radu DONOSE

IPC: G03F7/20 ,  F25D3/10

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.