公开(公告)号：US10750604B2

公开(公告)日：2020-08-18

申请号：US15781885

申请日：2016-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Frederik Dijksman ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Ronald Johannes Hultermans ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Peter Wilhelm Hendrik Van Putten

IPC: H05G2/00

Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.