公开(公告)号：US20240274457A1

公开(公告)日：2024-08-15

申请号：US18569484

申请日：2022-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicholas Alan Allsop ,  Benedikt Schmidt ,  Constans Mathias Weber ,  Till Warming ,  Jianqiang Zhu ,  Milad Mokhtari ,  Antonius Hubertus Van Schijndel

IPC: H01L21/683 ,  B25B11/00

CPC classification number: H01L21/6833 ,  B25B11/00 ,  H01L21/6838

Abstract: A holding device (100) for holding a structural part, in particular a semiconductor wafer (1) or a lithography mask, comprises a base body (10), which is formed from at least one board (11) with an upper side, and a plurality of protruding studs (12), which are arranged on the upper side of the board (11) and form a contact surface (13) with a predetermined flatness for contacting the structural part, wherein on the upper side of the board (11) a notch absorption layer (21) is provided, which has such a low volume density that the notch absorption layer (21) can be compressed by a compaction in the layer volume in the case of mechanical actions by foreign particles (2), without compromising the flatness of the contact surface (13). A method for manufacturing a holding device (100) for holding a structural part is also described.