公开(公告)号：US11947266B2

公开(公告)日：2024-04-02

申请号：US17297171

申请日：2019-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Petrus Marcus Brantjes ,  Matthijs Cox ,  Boris Menchtchikov ,  Cyrus Emil Tabery ,  Youping Zhang ,  Yi Zou ,  Chenxi Lin ,  Yana Cheng ,  Simon Philip Spencer Hastings ,  Maxim Philippe Frederic Genin

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70491 ,  G03F7/70633 ,  G03F9/7046

Abstract: A method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method including: obtaining a set of pre-process metrology data; processing the set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed set of pre-process metrology data to determine the correction for the semiconductor manufacturing process.