公开(公告)号：US20240419088A1

公开(公告)日：2024-12-19

申请号：US18719902

申请日：2022-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Akshay Dipakkumar HARLALKA ,  Muthukumaran LOGANATHAN ,  Eric Scott SLOAN ,  Bill CHANG ,  Santiago E. DEL PUERTO ,  Daniel Nathan BURBANK ,  Brandon Adam EVANS ,  Venkata Siva Chaithanya CHILLARA ,  Joseph George WIHBEY, III

IPC: G03F7/00

Abstract: Systems, methods, and computer programs for providing a force opposed to inertial forces present on a patterning device during imaging operations of a photolithographic system include a means for providing coarse positioning of a pusher in combination with a short-stroke actuator and pushing tip configured to engage an edge of the patterning device. In an embodiment, the coarse positioning is provided by providing a guide along which the short-stroke actuator may be translated, and a locking mechanism is configured to selectively hold the actuator in place relative to the patterning device. In an embodiment, the coarse positioning is provided by a long-stroke actuator, for example an eccentric linear drive actuator.