公开(公告)号：US20200159134A1

公开(公告)日：2020-05-21

申请号：US16629359

申请日：2018-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： An GAO ,  Sanjaysingh LALBAHADOERSING ,  Audrey Alexandrovich NIKIPELOV ,  Alexey Olegovich POLYAKOV ,  Brennan PETERSON

IPC: G03F9/00 ,  G03F7/20 ,  H01L23/544

Abstract: An apparatus for determining information relating to at least one target alignment mark in a semiconductor device substrate. The target alignment mark is initially at least partially obscured by an opaque carbon or metal layer on the substrate. The apparatus includes an energy delivery system configured to emit a laser beam for modifying at least one portion of the opaque layer to cause a phase change and/or chemical change in the at least one portion that increases the transparency of the portion. An optical signal can propagate through the modified portion to determine information relating to the target alignment mark.