公开(公告)号：US11156928B2

公开(公告)日：2021-10-26

申请号：US16615882

申请日：2018-05-02

Applicant: ASML Holding N.V.

Inventor： Gerrit Johannes Nijmeijer ,  Junqiang Zhou ,  Piotr Jan Meyer ,  Jeffrey John Lombardo ,  Igor Matheus Petronella Aarts

IPC: G03F9/00

Abstract: An alignment mark for determining a two-dimensional alignment position of a substrate is discussed. The alignment mark includes an array of patterns. The array of patterns includes a first set of patterns and a second set of patterns arranged. The first set of patterns is arranged in a first sequence along a first direction. The second set of patterns is arranged in a second sequence along the first direction. The second sequence is different from the first sequence. Each pattern of the array of patterns is different from other patterns of the array of patterns that are adjacent to the each pattern.