公开(公告)号：US20140374024A1

公开(公告)日：2014-12-25

申请号：US13962575

申请日：2013-08-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  TOM K. CHO ,  KARTIK RAMASWAMY ,  YOGANANDA SARODE VISHWANATH

IPC: H01J37/32 ,  B08B7/00 ,  C23C16/48 ,  H01L21/67 ,  C23C16/455

Abstract: Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.

Abstract translation: 本文提供了用于从双室处理系统中去除颗粒的设备的实施例。 在一些实施例中，用于从双室处理系统中去除颗粒的装置包括远程等离子体系统; 以及多个导管将远程等离子体系统流体耦合到双室处理系统的每个处理室，以将等离子体提供给每个处理室的排气体积，其中多个管道中的每个导管具有沿着 各排气量。